{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,9,17]],"date-time":"2025-09-17T15:56:33Z","timestamp":1758124593585,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":19,"publisher":"ACM","license":[{"start":{"date-parts":[[2015,5,20]],"date-time":"2015-05-20T00:00:00Z","timestamp":1432080000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"funder":[{"name":"National Science Foundation (NSF)"},{"name":"Semiconductor Research Corporation (SRC)"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2015,5,20]]},"DOI":"10.1145\/2742060.2742114","type":"proceedings-article","created":{"date-parts":[[2015,5,19]],"date-time":"2015-05-19T13:49:03Z","timestamp":1432043343000},"page":"83-86","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":14,"title":["Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design"],"prefix":"10.1145","author":[{"given":"Jiaojiao","family":"Ou","sequence":"first","affiliation":[{"name":"The University of Texas at Austin, Austin, TX, USA"}]},{"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"The University of Texas at Austin, Austin, TX, USA"}]},{"given":"Jhih-Rong","family":"Gao","sequence":"additional","affiliation":[{"name":"The University of Texas at Austin, Austin, TX, USA"}]},{"given":"David Z.","family":"Pan","sequence":"additional","affiliation":[{"name":"The University of Texas at Austin, Austin, TX, USA"}]},{"given":"Moshe","family":"Preil","sequence":"additional","affiliation":[{"name":"GLOBALFOUNDRIES, Santa Clara, CA, USA"}]},{"given":"Azat","family":"Latypov","sequence":"additional","affiliation":[{"name":"GLOBALFOUNDRIES, Santa Clara, CA, USA"}]}],"member":"320","published-online":{"date-parts":[[2015,5,20]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2013.2276751"},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/2429384.2429430"},{"key":"e_1_3_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.mattod.2013.11.002"},{"volume-title":"MEMS, and MOEMS","author":"Seino Y.","key":"e_1_3_2_1_4_1"},{"volume-title":"of SPIE","year":"2012","author":"Yi H.","key":"e_1_3_2_1_5_1"},{"key":"e_1_3_2_1_6_1","first-page":"186","volume-title":"Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library,\" in IEEE\/ACM International Conference on Computer-Aided Design (ICCAD)","author":"Du Y.","year":"2013"},{"key":"e_1_3_2_1_7_1","volume-title":"Proc. of SPIE","volume":"9049","author":"Du Y.","year":"2014"},{"key":"e_1_3_2_1_8_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2010.2042882"},{"volume-title":"DSA Template Mask Determination and Cut Redistribution for Advanced 1D Gridded Design,\" in Proc. of SPIE","year":"2013","author":"Xiao Z.","key":"e_1_3_2_1_9_1"},{"volume-title":"of SPIE","year":"2012","author":"Wong H.-S. P.","key":"e_1_3_2_1_10_1"},{"volume-title":"Characterization of 1D layout technology at advanced nodes and low k1,\" in Proc. of SPIE","year":"2014","author":"Axelrad V.","key":"e_1_3_2_1_11_1"},{"volume-title":"Gridded design rule scaling: taking the CPU toward the 16nm node,\" in Proc. of SPIE","year":"2009","author":"Bencher C.","key":"e_1_3_2_1_12_1"},{"issue":"1","key":"e_1_3_2_1_13_1","first-page":"011002","article-title":"Triple patterning lithography layout decomposition using end-cutting","volume":"14","author":"Yu B.","year":"2015","journal-title":"Journal of Microlithography, Microfabrication and Microsystems"},{"key":"e_1_3_2_1_14_1","doi-asserted-by":"publisher","DOI":"10.1145\/2593069.2593233"},{"key":"e_1_3_2_1_15_1","doi-asserted-by":"crossref","unstructured":"Y. Du H. Zhang M. D. Wong and K.-Y. Chao \"Hybrid lithography optimization with e-beam and immersion processes for 16nm 1D gridded design \" in IEEE\/ACM Asia and South Pacific Design Automation Conference (ASPDAC) 2012.  Y. Du H. Zhang M. D. Wong and K.-Y. Chao \"Hybrid lithography optimization with e-beam and immersion processes for 16nm 1D gridded design \" in IEEE\/ACM Asia and South Pacific Design Automation Conference (ASPDAC) 2012.","DOI":"10.1109\/ASPDAC.2012.6165047"},{"volume-title":"Self-aligned double patterning layout decomposition with complementary e-beam lithography,\" in IEEE\/ACM Asia and South Pacific Design Automation Conference (ASPDAC)","year":"2014","author":"Gao J.-R.","key":"e_1_3_2_1_16_1"},{"volume-title":"topographical templates: potential lithography solution for integrated circuit contact hole patterning,\" Advanced Meterials","author":"He Y.","key":"e_1_3_2_1_17_1"},{"volume-title":"Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact\/via applications,\" in Proc. of SPIE","year":"2014","author":"Ma Y.","key":"e_1_3_2_1_18_1"},{"key":"e_1_3_2_1_19_1","unstructured":"\"Gurobi.\" {Online}. Available: http:\/\/www.gurobi.com  \"Gurobi.\" {Online}. Available: http:\/\/www.gurobi.com"}],"event":{"name":"GLSVLSI '15: Great Lakes Symposium on VLSI 2015","sponsor":["SIGDA ACM Special Interest Group on Design Automation","IEEE CEDA","IEEE CASS"],"location":"Pittsburgh Pennsylvania USA","acronym":"GLSVLSI '15"},"container-title":["Proceedings of the 25th edition on Great Lakes Symposium on VLSI"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2742060.2742114","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2742060.2742114","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T07:00:32Z","timestamp":1750230032000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2742060.2742114"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,5,20]]},"references-count":19,"alternative-id":["10.1145\/2742060.2742114","10.1145\/2742060"],"URL":"https:\/\/doi.org\/10.1145\/2742060.2742114","relation":{},"subject":[],"published":{"date-parts":[[2015,5,20]]},"assertion":[{"value":"2015-05-20","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}