{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,14]],"date-time":"2025-10-14T11:28:55Z","timestamp":1760441335479,"version":"3.41.0"},"reference-count":21,"publisher":"Association for Computing Machinery (ACM)","issue":"3","license":[{"start":{"date-parts":[[2016,5,11]],"date-time":"2016-05-11T00:00:00Z","timestamp":1462924800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"funder":[{"name":"Research Grants Council of the Hong Kong Special Administrative Region, China","award":["CUHK418611"],"award-info":[{"award-number":["CUHK418611"]}]}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":["ACM Trans. Des. Autom. Electron. Syst."],"published-print":{"date-parts":[[2016,7,26]]},"abstract":"<jats:p>\n            To reduce chip-scale topography variation, dummy fill is commonly used to improve the layout density uniformity. Previous works either sought the most uniform density distribution or sought to minimize the inserted dummy fills while satisfying certain density uniformity constraint. However, due to more stringent manufacturing challenges, more criteria, like line deviation and outlier, emerge at newer technology nodes. This article presents a joint optimization scheme to consider variation, total fill, line deviation, outlier, overlap, and running time simultaneously. More specifically, first we decompose the rectilinear polygons and partition fillable regions into rectangles for easier processing. After decomposition, we insert dummy fills into the fillable rectangular regions optimizing the fill metrics simultaneously. We propose three approaches,\n            <jats:italic>Fast Median<\/jats:italic>\n            approach,\n            <jats:italic>LP<\/jats:italic>\n            approach, and\n            <jats:italic>Iterative<\/jats:italic>\n            approach, which are much faster with better quality, compared with the results of the top three contestants in the ICCAD Contest 2014.\n          <\/jats:p>","DOI":"10.1145\/2886097","type":"journal-article","created":{"date-parts":[[2016,5,13]],"date-time":"2016-05-13T14:30:58Z","timestamp":1463149858000},"page":"1-21","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":7,"title":["An Effective Chemical Mechanical Polishing Fill Insertion Approach"],"prefix":"10.1145","volume":"21","author":[{"given":"Chuangwen","family":"Liu","sequence":"first","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Peishan","family":"Tu","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Pangbo","family":"Wu","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Haomo","family":"Tang","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yande","family":"Jiang","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jian","family":"Kuang","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Evangeline F. Y.","family":"Young","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Shatin, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2016,5,11]]},"reference":[{"key":"e_1_2_1_1_1","doi-asserted-by":"crossref","unstructured":"Yu Chen Puneet Gupta and Andrew B. Kahng. 2003. Performance-impact limited-area fill synthesis. In Advanced Microelectronic Manufacturing. International Society for Optics and Photonics 75--86.  Yu Chen Puneet Gupta and Andrew B. Kahng. 2003. Performance-impact limited-area fill synthesis. In Advanced Microelectronic Manufacturing. International Society for Optics and Photonics 75--86.","DOI":"10.1117\/12.487732"},{"key":"e_1_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/368434.368778"},{"key":"e_1_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2002.802278"},{"key":"e_1_2_1_4_1","doi-asserted-by":"crossref","unstructured":"Stephane Durocher and Saeed Mehrabi. 2012. Computing partitions of rectilinear polygons with minimum stabbing number. In COCOON. Springer 228--239.  Stephane Durocher and Saeed Mehrabi. 2012. Computing partitions of rectilinear polygons with minimum stabbing number. In COCOON. 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