{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,6,19]],"date-time":"2025-06-19T04:12:29Z","timestamp":1750306349364,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":19,"publisher":"ACM","license":[{"start":{"date-parts":[[2016,11,7]],"date-time":"2016-11-07T00:00:00Z","timestamp":1478476800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2016,11,7]]},"DOI":"10.1145\/2966986.2967025","type":"proceedings-article","created":{"date-parts":[[2016,10,18]],"date-time":"2016-10-18T12:23:59Z","timestamp":1476793439000},"page":"1-8","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":2,"title":["DSA-compliant routing for two-dimensional patterns using block copolymer lithography"],"prefix":"10.1145","author":[{"given":"Yu-Hsuan","family":"Su","sequence":"first","affiliation":[{"name":"National Taiwan University, Taipei, Taiwan"}]},{"given":"Yao-Wen","family":"Chang","sequence":"additional","affiliation":[{"name":"National Taiwan University, Taipei, Taiwan"}]}],"member":"320","published-online":{"date-parts":[[2016,11,7]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1145\/2872334.2893445"},{"key":"e_1_3_2_1_2_1","volume-title":"Design rules for self-assembled block copolymer patterns using tiled templates,\" Nature Communications, no. 5","author":"Chang J.-B.","year":"2014","unstructured":"J.-B. Chang, H.-K. Choi, A. F. Hannon, A. Alexander-Katz, C. A. Ross, K. K. Berggren, and Y. Ma, \"Design rules for self-assembled block copolymer patterns using tiled templates,\" Nature Communications, no. 5, 2014."},{"key":"e_1_3_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1145\/2593069.2593233"},{"key":"e_1_3_2_1_4_1","first-page":"707","volume-title":"ASPDAC","author":"Du Y.","year":"2012","unstructured":"Y. Du, H. Zhang, M.-D.-F. Wong, and K.-Y. Chao, \"Hybrid lithography optimization with E-beam and immersion processes for 16nm 1D gridded design,\" Proc. ASPDAC, pp. 707--712, 2012."},{"key":"e_1_3_2_1_5_1","doi-asserted-by":"publisher","DOI":"10.5555\/2561828.2561866"},{"key":"e_1_3_2_1_6_1","first-page":"2014","volume-title":"SPIE","volume":"9049","author":"Du Y.","unstructured":"Y. Du, D. Xiao, M.-D.-F. Wong, H. Yi, and H.-S.P. Wong, \"DSA-aware detailed routing for via layer optimization,\" Proc. SPIE, vol. 9049, pp.90492J, 2014."},{"key":"e_1_3_2_1_7_1","first-page":"C58","article-title":"Sub-10-nm half-pitch electron-beam lithography by using PMMA as a negative resist","volume":"28","author":"Duan H.","year":"2010","unstructured":"H. Duan, D. Winston, J. K. W. Yang2, B. M. Cord, V. R. Manfrinato, and K. K. Berggren, \"Sub-10-nm half-pitch electron-beam lithography by using PMMA as a negative resist,\" J.-Vac.-Sci.-Technol.-B 28, vol. C6C58, 2010.","journal-title":"J.-Vac.-Sci.-Technol.-B"},{"volume-title":"Directed self-assembly of block copolymers for next generation nanolithography,\" Materials Today","author":"Jeong S.-J.","key":"e_1_3_2_1_8_1","unstructured":"S.-J. Jeong, J. Y. Kim, B. H. Kim, H.-S. Moon, and S. O. Kim, \"Directed self-assembly of block copolymers for next generation nanolithography,\" Materials Today, vol. 16, no. 12, 2013."},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1021\/nl404067s"},{"key":"e_1_3_2_1_10_1","unstructured":"2015 International technology roadmap for semiconductors http:\/\/www.itrs2.net\/itrs-reports.html"},{"key":"e_1_3_2_1_11_1","first-page":"312","volume-title":"ASPDAC","author":"Kuang J.","year":"2016","unstructured":"J. Kuang, J. Ye, and E. F. Y. Young, \"Simultaneous template optimization and mask assignment for DSA with multiple patterning,\" Proc. ASPDAC, pp. 312--318, 2016."},{"key":"e_1_3_2_1_12_1","first-page":"10","volume-title":"ASPDAC","author":"Lin Z.-W.","year":"2016","unstructured":"Z.-W. Lin and Y.-W. Chang, \"Cut redistribution with directed self-assembly templates for advanced 1-D gridded layouts,\" Proc. ASPDAC, pp. 10--18, 2016."},{"key":"e_1_3_2_1_13_1","doi-asserted-by":"publisher","DOI":"10.1145\/2872334.2872350"},{"key":"e_1_3_2_1_14_1","first-page":"2014","volume-title":"SPIE","volume":"9231","author":"Ma Y.","unstructured":"Y. Ma, J. A. Torres, G. Fenger, Y. Granik, J. Ryckaert, G. Vanderberghe, J. Bekaert, and J. Word \"Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact\/via applications,\" Proc. SPIE, vol. 9231, pp.92310T, 2014."},{"key":"e_1_3_2_1_15_1","doi-asserted-by":"publisher","DOI":"10.1145\/2742060.2742114"},{"key":"e_1_3_2_1_16_1","volume-title":"Pattern scaling with directed self assembly through lithography and etch process integraiton,\" Proc","author":"Rathsack B.","year":"2012","unstructured":"B. Rathsack, M. Somervell, J. Hoose, M. Muramatsu, K. Tanouchi, T. Kitano, E. Nishimura, K. Yatsuda, S. Nagahara, I. Hiroyuki, K. Akai, and T. Hayakawa, \"Pattern scaling with directed self assembly through lithography and etch process integraiton,\" Proc. SPIE, vol. 8323, pp. 83230B, 2012."},{"key":"e_1_3_2_1_17_1","doi-asserted-by":"publisher","DOI":"10.1145\/2744769.2744874"},{"key":"e_1_3_2_1_18_1","first-page":"888017","volume-title":"SPIE","volume":"8880","author":"Xiao Z.","year":"2013","unstructured":"Z. Xiao, Y. Du, H. Tian, and M. D. F. Wong, \"DSA template mask determination and cut redistribution for advanced 1D gridded design,\" Proc. SPIE, vol. 8880, pp. 888017--1, 2013."},{"key":"e_1_3_2_1_19_1","unstructured":"IBM ILOG CPLEX Optimizer. http:\/\/www-01.ibm.com\/software\/integration\/optimization\/cplex-optimizer\/"}],"event":{"name":"ICCAD '16: IEEE\/ACM INTERNATIONAL CONFERENCE ON COMPUTER-AIDED DESIGN","sponsor":["SIGDA ACM Special Interest Group on Design Automation","IEEE CAS","IEEE CS","IEEE-EDS Electronic Devices Society"],"location":"Austin Texas","acronym":"ICCAD '16"},"container-title":["Proceedings of the 35th International Conference on Computer-Aided Design"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2966986.2967025","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2966986.2967025","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T04:55:54Z","timestamp":1750222554000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2966986.2967025"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2016,11,7]]},"references-count":19,"alternative-id":["10.1145\/2966986.2967025","10.1145\/2966986"],"URL":"https:\/\/doi.org\/10.1145\/2966986.2967025","relation":{},"subject":[],"published":{"date-parts":[[2016,11,7]]},"assertion":[{"value":"2016-11-07","order":3,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}