{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,7,28]],"date-time":"2025-07-28T21:47:06Z","timestamp":1753739226897,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":18,"publisher":"ACM","license":[{"start":{"date-parts":[[2018,11,5]],"date-time":"2018-11-05T00:00:00Z","timestamp":1541376000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2018,11,5]]},"DOI":"10.1145\/3240765.3240832","type":"proceedings-article","created":{"date-parts":[[2018,11,6]],"date-time":"2018-11-06T13:36:57Z","timestamp":1541511417000},"page":"1-7","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":8,"title":["Novel proximal group ADMM for placement considering fogging and proximity effects"],"prefix":"10.1145","author":[{"given":"Jianli","family":"Chen","sequence":"first","affiliation":[{"name":"Fuzhou University, Fuzhou, China"}]},{"given":"Li","family":"Yang","sequence":"additional","affiliation":[{"name":"Fuzhou University, Fuzhou, China"}]},{"given":"Zheng","family":"Peng","sequence":"additional","affiliation":[{"name":"Fuzhou University, Fuzhou, China"}]},{"given":"Wenxing","family":"Zhu","sequence":"additional","affiliation":[{"name":"Fuzhou University, Fuzhou, China"}]},{"given":"Yao-Wen","family":"Chang","sequence":"additional","affiliation":[{"name":"National Taiwan University, Taipei, Taiwan"}]}],"member":"320","published-online":{"date-parts":[[2018,11,5]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1145\/2717764.2723572"},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/1055137.1055177"},{"key":"e_1_3_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1145\/2744769.2747925"},{"key":"e_1_3_2_1_4_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2008.923063"},{"key":"e_1_3_2_1_5_1","doi-asserted-by":"publisher","DOI":"10.5555\/2840819.2840890"},{"key":"e_1_3_2_1_6_1","doi-asserted-by":"publisher","DOI":"10.1023\/A:1022503820909"},{"key":"e_1_3_2_1_7_1","doi-asserted-by":"publisher","DOI":"10.1145\/3061639.3062252"},{"key":"e_1_3_2_1_8_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2006.01.184"},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2007.01.025"},{"key":"e_1_3_2_1_10_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2005.846366"},{"volume-title":"Influence of data","author":"Lin S.-J.","key":"e_1_3_2_1_11_1","unstructured":"S.-J. Lin, P.-Y. Liu, C.-H. Chen, W.-C. Wang, J.-J. Shin, B.J. Lin, M. A. McCord, and S. K. Shriyan. Influence of data volume and EPC on process window in massively parallel e-beam direct write. The International Society for Optical Engineering, 8680(5), 2013."},{"key":"e_1_3_2_1_12_1","volume-title":"Non-linear optimization system and method for wire length and delay optimization for an automatic electric circuit placer","author":"Naylor W. C.","year":"2001","unstructured":"W. C. Naylor, R. Donelly, and L. Sha. Non-linear optimization system and method for wire length and delay optimization for an automatic electric circuit placer, 2001."},{"key":"e_1_3_2_1_13_1","first-page":"35","volume-title":"Microlithography","author":"Pain L.","year":"2005","unstructured":"L. Pain, M. Jurdit, J. Todeschini, S. Manakli, B. Icard, B. Minghetti, G. Bervin, A. Beverina, F. Leverd, and M. Broekaart. Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction. In Microlithography, pages 35--45, 2005."},{"key":"e_1_3_2_1_14_1","doi-asserted-by":"publisher","DOI":"10.1109\/TSP.2014.2304432"},{"key":"e_1_3_2_1_15_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.360242"},{"key":"e_1_3_2_1_16_1","first-page":"313","volume-title":"International Conference on VlSI Design and 2018 International Conference on Embedded Systems","author":"Sinharay A.","year":"2018","unstructured":"A. Sinharay, P. Roy, and H. Rahaman. Computing fr\u00c3l'chet distance metric based L-shape tile decomposition for e-beam lithography. In International Conference on VlSI Design and 2018 International Conference on Embedded Systems, pages 313--318, 2018."},{"key":"e_1_3_2_1_17_1","doi-asserted-by":"publisher","DOI":"10.1145\/1353629.1353640"},{"key":"e_1_3_2_1_18_1","doi-asserted-by":"publisher","DOI":"10.5555\/2843514"}],"event":{"name":"ICCAD '18: IEEE\/ACM INTERNATIONAL CONFERENCE ON COMPUTER-AIDED DESIGN","sponsor":["IEEE-EDS Electronic Devices Society","IEEE CAS","IEEE CEDA"],"location":"San Diego California","acronym":"ICCAD '18"},"container-title":["Proceedings of the International Conference on Computer-Aided Design"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3240765.3240832","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/3240765.3240832","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T00:57:33Z","timestamp":1750208253000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3240765.3240832"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2018,11,5]]},"references-count":18,"alternative-id":["10.1145\/3240765.3240832","10.1145\/3240765"],"URL":"https:\/\/doi.org\/10.1145\/3240765.3240832","relation":{},"subject":[],"published":{"date-parts":[[2018,11,5]]},"assertion":[{"value":"2018-11-05","order":3,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}