{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,5,16]],"date-time":"2026-05-16T16:06:08Z","timestamp":1778947568920,"version":"3.51.4"},"publisher-location":"New York, NY, USA","reference-count":28,"publisher":"ACM","license":[{"start":{"date-parts":[[2019,6,2]],"date-time":"2019-06-02T00:00:00Z","timestamp":1559433600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2019,6,2]]},"DOI":"10.1145\/3316781.3317852","type":"proceedings-article","created":{"date-parts":[[2019,5,23]],"date-time":"2019-05-23T18:07:13Z","timestamp":1558634833000},"page":"1-6","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":51,"title":["LithoGAN"],"prefix":"10.1145","author":[{"given":"Wei","family":"Ye","sequence":"first","affiliation":[{"name":"ECE Department, UT Austin"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Mohamed Baker","family":"Alawieh","sequence":"additional","affiliation":[{"name":"ECE Department, UT Austin"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yibo","family":"Lin","sequence":"additional","affiliation":[{"name":"ECE Department, UT Austin"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"David Z.","family":"Pan","sequence":"additional","affiliation":[{"name":"ECE Department, UT Austin"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2019,6,2]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1117\/3.401208"},{"key":"e_1_3_2_1_2_1","volume-title":"Fundamental Principles of Optical Lithography: The Science of Microfabrication","author":"Mack C. A.","year":"2008"},{"key":"e_1_3_2_1_3_1","volume-title":"Principles of Lithography","author":"Levinson H.","year":"2011"},{"key":"e_1_3_2_1_4_1","doi-asserted-by":"publisher","DOI":"10.1117\/3.665802"},{"key":"e_1_3_2_1_5_1","volume-title":"Computational lithography","author":"Ma X.","year":"2011"},{"key":"e_1_3_2_1_6_1","volume-title":"Computational electrodynamics: the finite-difference time-domain method","author":"Taflove A.","year":"2005"},{"key":"e_1_3_2_1_7_1","doi-asserted-by":"publisher","DOI":"10.1364\/JOSAA.13.002187"},{"key":"e_1_3_2_1_8_1","unstructured":"\"A review of model development for 10nm lithography \" http:\/\/www.techdesignforums.com\/practice\/technique\/model-development-10nm-lithography 2015.  \"A review of model development for 10nm lithography \" http:\/\/www.techdesignforums.com\/practice\/technique\/model-development-10nm-lithography 2015."},{"key":"e_1_3_2_1_9_1","volume-title":"SPIE","volume":"3679","author":"John Randall T. M. A.-M. G. M. E.","year":"1999"},{"key":"e_1_3_2_1_10_1","volume-title":"SPIE","volume":"10147","author":"Yuki Watanabe T. M. S. N.","year":"2017"},{"key":"e_1_3_2_1_11_1","volume-title":"Proc. SPIE","volume":"10147","author":"Seongbo Shim Y. S.","year":"2017"},{"key":"e_1_3_2_1_12_1","volume-title":"Data efficient lithography modeling with transfer learning and active data selection,\" IEEE TCAD","author":"Lin Y.","year":"2018"},{"key":"e_1_3_2_1_13_1","first-page":"1","volume-title":"ITC","author":"Lin Y.","year":"2018"},{"key":"e_1_3_2_1_14_1","first-page":"2672","volume-title":"NIPS","author":"Goodfellow I.","year":"2014"},{"key":"e_1_3_2_1_15_1","volume-title":"Conditional generative adversarial nets,\" arXiv preprint arXiv:1411.1784","author":"Mirza M.","year":"2014"},{"key":"e_1_3_2_1_16_1","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2017.632"},{"issue":"3","key":"e_1_3_2_1_17_1","first-page":"4","article-title":"Photo-realistic single image super-resolution using a generative adversarial network","volume":"2","author":"Ledig C.","year":"2017","journal-title":"Proc. CVPR"},{"key":"e_1_3_2_1_18_1","volume-title":"2017 IEEE International Conference on","author":"Zhu J.-Y.","year":"2017"},{"key":"e_1_3_2_1_19_1","doi-asserted-by":"publisher","DOI":"10.1145\/3195970.3196056"},{"key":"e_1_3_2_1_20_1","doi-asserted-by":"publisher","DOI":"10.1145\/2872334.2872357"},{"key":"e_1_3_2_1_21_1","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2015.7298965"},{"key":"e_1_3_2_1_22_1","volume-title":"Unsupervised representation learning with deep convolutional generative adversarial networks,\" arXiv preprint arXiv:1511.06434","author":"Radford A.","year":"2015"},{"key":"e_1_3_2_1_23_1","first-page":"03167","article-title":"Batch normalization: Accelerating deep network training by reducing internal covariate shift","volume":"1502","author":"Ioffe S.","year":"2015","journal-title":"CoRR"},{"key":"e_1_3_2_1_24_1","volume-title":"Adam: A method for stochastic optimization,\" CoRR","author":"Kingma D. P.","year":"2014"},{"key":"e_1_3_2_1_25_1","first-page":"265","volume-title":"OSDI","volume":"16","author":"Abadi M.","year":"2016"},{"key":"e_1_3_2_1_26_1","unstructured":"Mentor Graphics \"Calibre verification user's manual \" 2008.  Mentor Graphics \"Calibre verification user's manual \" 2008."},{"key":"e_1_3_2_1_27_1","unstructured":"Synopsys \"Sentaurus Lithography \" https:\/\/www.synopsys.com\/silicon\/mask-synthesis\/sentaurus-lithography.html 2016.  Synopsys \"Sentaurus Lithography \" https:\/\/www.synopsys.com\/silicon\/mask-synthesis\/sentaurus-lithography.html 2016."},{"key":"e_1_3_2_1_28_1","volume-title":"Hybrid hotspot detection using regression model and lithography simulation,\" in Proc","author":"Kimura T.","year":"2016"}],"event":{"name":"DAC '19: The 56th Annual Design Automation Conference 2019","location":"Las Vegas NV USA","acronym":"DAC '19","sponsor":["SIGDA ACM Special Interest Group on Design Automation","IEEE-CEDA","SIGBED ACM Special Interest Group on Embedded Systems"]},"container-title":["Proceedings of the 56th Annual Design Automation Conference 2019"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3316781.3317852","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/3316781.3317852","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,17]],"date-time":"2025-06-17T23:53:52Z","timestamp":1750204432000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3316781.3317852"}},"subtitle":["End-to-End Lithography Modeling with Generative Adversarial Networks"],"short-title":[],"issued":{"date-parts":[[2019,6,2]]},"references-count":28,"alternative-id":["10.1145\/3316781.3317852","10.1145\/3316781"],"URL":"https:\/\/doi.org\/10.1145\/3316781.3317852","relation":{},"subject":[],"published":{"date-parts":[[2019,6,2]]},"assertion":[{"value":"2019-06-02","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}