{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,29]],"date-time":"2026-03-29T09:10:39Z","timestamp":1774775439610,"version":"3.50.1"},"publisher-location":"New York, NY, USA","reference-count":31,"publisher":"ACM","license":[{"start":{"date-parts":[[2022,10,30]],"date-time":"2022-10-30T00:00:00Z","timestamp":1667088000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2022,10,30]]},"DOI":"10.1145\/3508352.3549468","type":"proceedings-article","created":{"date-parts":[[2022,12,22]],"date-time":"2022-12-22T12:10:54Z","timestamp":1671711054000},"page":"1-9","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":10,"title":["AdaOPC"],"prefix":"10.1145","author":[{"given":"Wenqian","family":"Zhao","sequence":"first","affiliation":[{"name":"CUHK"}]},{"given":"Xufeng","family":"Yao","sequence":"additional","affiliation":[{"name":"CUHK"}]},{"given":"Ziyang","family":"Yu","sequence":"additional","affiliation":[{"name":"CUHK"}]},{"given":"Guojin","family":"Chen","sequence":"additional","affiliation":[{"name":"CUHK"}]},{"given":"Yuzhe","family":"Ma","sequence":"additional","affiliation":[{"name":"HKUST(GZ)"}]},{"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"CUHK"}]},{"given":"Martin D. F.","family":"Wong","sequence":"additional","affiliation":[{"name":"CUHK"}]}],"member":"320","published-online":{"date-parts":[[2022,12,22]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2013.2276751"},{"key":"e_1_3_2_1_2_1","first-page":"81","volume-title":"IEEE","author":"Park J.-S.","year":"2000","unstructured":"J.-S. Park, C.-H. Park, S.-U. Rhie, Y.-H. Kim, M.-H. Yoo, J.-T. Kong, H.-W. Kim, and S.-I. Yoo, \"An efficient rule-based opc approach using a drc tool for 0.18\/spl mu\/m asic,\" in Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525). IEEE, 2000, pp. 81--85."},{"key":"e_1_3_2_1_3_1","first-page":"1591","volume-title":"Automation & Test in Europe Conference & Exhibition (DATE). IEEE","author":"Kuang J.","year":"2015","unstructured":"J. Kuang, W.-K. Chow, and E. F. Young, \"A robust approach for process variation aware mask optimization,\" in 2015 Design, Automation & Test in Europe Conference & Exhibition (DATE). IEEE, 2015, pp. 1591--1594."},{"key":"e_1_3_2_1_4_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2015.2514082"},{"key":"e_1_3_2_1_5_1","volume-title":"Optical proximity correction with hierarchical bayes model,\" in Optical Microlithography XXVIII","author":"Matsunawa T.","year":"2015","unstructured":"T. Matsunawa, B. Yu, and D. Z. Pan, \"Optical proximity correction with hierarchical bayes model,\" in Optical Microlithography XXVIII, vol. 9426. International Society for Optics and Photonics, 2015, p. 94260X."},{"key":"e_1_3_2_1_6_1","doi-asserted-by":"publisher","DOI":"10.5555\/2319069.2321311"},{"key":"e_1_3_2_1_7_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.2981457"},{"key":"e_1_3_2_1_8_1","doi-asserted-by":"publisher","DOI":"10.23919\/DATE51398.2021.9474212"},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2019.2939329"},{"key":"e_1_3_2_1_10_1","first-page":"412","volume-title":"A fast machine learning-based mask printability predictor for opc acceleration,\" in Proceedings of the 24th Asia and South Pacific Design Automation Conference","author":"Jiang B.","year":"2019","unstructured":"B. Jiang, H. Zhang, J. Yang, and E. F. Young, \"A fast machine learning-based mask printability predictor for opc acceleration,\" in Proceedings of the 24th Asia and South Pacific Design Automation Conference, 2019, pp. 412--419."},{"key":"e_1_3_2_1_11_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2019.2943568"},{"key":"e_1_3_2_1_12_1","article-title":"Damo: Deep agile mask optimization for full chip scale","author":"Chen G.","year":"2021","unstructured":"G. Chen, W. Chen, Q. Sun, Y. Ma, H. Yang, and B. Yu, \"Damo: Deep agile mask optimization for full chip scale,\" IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2021.","journal-title":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"},{"key":"e_1_3_2_1_13_1","first-page":"1","volume-title":"IEEE","author":"Chen G.","year":"2021","unstructured":"G. Chen, Z. Yu, H. Liu, Y. Ma, and B. Yu, \"Develset: Deep neural level set for instant mask optimization,\" in 2021 IEEE\/ACM International Conference On Computer Aided Design (ICCAD). IEEE, 2021, pp. 1--9."},{"key":"e_1_3_2_1_14_1","first-page":"1","volume-title":"IEEE","author":"Jiang B.","year":"2020","unstructured":"B. Jiang, L. Liu, Y. Ma, H. Zhang, B. Yu, and E. F. Young, \"Neural-ilt: Migrating ilt to neural networks for mask printability and complexity co-optimization,\" in 2020 IEEE\/ACM International Conference On Computer Aided Design (ICCAD). IEEE, 2020, pp. 1--9."},{"issue":"1093","key":"e_1_3_2_1_15_1","first-page":"263","article-title":"The concept of partial coherence in optics","volume":"208","author":"Hopkins H. H.","year":"1951","unstructured":"H. H. Hopkins, \"The concept of partial coherence in optics,\" Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, vol. 208, no. 1093, pp. 263--277, 1951.","journal-title":"Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences"},{"key":"e_1_3_2_1_16_1","doi-asserted-by":"publisher","DOI":"10.5555\/927160"},{"key":"e_1_3_2_1_17_1","first-page":"1","volume-title":"IEEE","author":"Gao J.-R.","year":"2014","unstructured":"J.-R. Gao, X. Xu, B. Yu, and D. Z. Pan, \"Mosaic: Mask optimizing solution with process window aware inverse correction,\" in 2014 51st ACM\/EDAC\/IEEE Design Automation Conference (DAC). IEEE, 2014, pp. 1--6."},{"key":"e_1_3_2_1_18_1","volume-title":"Accurate lithography simulation model based on convolutional neural networks,\" in Optical Microlithography XXX","author":"Watanabe Y.","year":"2017","unstructured":"Y. Watanabe, T. Kimura, T. Matsunawa, and S. Nojima, \"Accurate lithography simulation model based on convolutional neural networks,\" in Optical Microlithography XXX, vol. 10147. International Society for Optics and Photonics, 2017, p. 101470K."},{"key":"e_1_3_2_1_19_1","first-page":"1","volume-title":"IEEE","author":"Ye W.","year":"2019","unstructured":"W. Ye, M. B. Alawieh, Y. Lin, and D. Z. Pan, \"Lithogan: End-to-end lithography modeling with generative adversarial networks,\" in 2019 56th ACM\/IEEE Design Automation Conference (DAC). IEEE, 2019, pp. 1--6."},{"key":"e_1_3_2_1_20_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015469"},{"key":"e_1_3_2_1_21_1","first-page":"2223","article-title":"Unpaired image-to-image translation using cycle-consistent adversarial networks","author":"Zhu J.-Y.","year":"2017","unstructured":"J.-Y. Zhu, T. Park, P. Isola, and A. A. Efros, \"Unpaired image-to-image translation using cycle-consistent adversarial networks,\" in Proceedings of the IEEE international conference on computer vision, 2017, pp. 2223--2232.","journal-title":"Proceedings of the IEEE international conference on computer vision"},{"key":"e_1_3_2_1_22_1","first-page":"770","article-title":"Deep residual learning for image recognition","author":"He K.","year":"2016","unstructured":"K. He, X. Zhang, S. Ren, and J. Sun, \"Deep residual learning for image recognition,\" in Proceedings of the IEEE conference on computer vision and pattern recognition, 2016, pp. 770--778.","journal-title":"Proceedings of the IEEE conference on computer vision and pattern recognition"},{"key":"e_1_3_2_1_23_1","volume-title":"Efficient and robust approximate nearest neighbor search using hierarchical navigable small world graphs,\" IEEE transactions on pattern analysis and machine intelligence","author":"Malkov Y. A.","unstructured":"Y. A. Malkov and D. A. Yashunin, \"Efficient and robust approximate nearest neighbor search using hierarchical navigable small world graphs,\" IEEE transactions on pattern analysis and machine intelligence, vol. 42, no. 4, pp. 824--836, 2018."},{"key":"e_1_3_2_1_24_1","first-page":"1735","volume-title":"IEEE","author":"Hadsell R.","year":"2006","unstructured":"R. Hadsell, S. Chopra, and Y. LeCun, \"Dimensionality reduction by learning an invariant mapping,\" in 2006 IEEE Computer Society Conference on Computer Vision and Pattern Recognition (CVPR'06), vol. 2. IEEE, 2006, pp. 1735--1742."},{"key":"e_1_3_2_1_25_1","first-page":"3733","article-title":"Unsupervised feature learning via non-parametric instance discrimination","author":"Wu Z.","year":"2018","unstructured":"Z. Wu, Y. Xiong, S. X. Yu, and D. Lin, \"Unsupervised feature learning via non-parametric instance discrimination,\" in Proceedings of the IEEE conference on computer vision and pattern recognition, 2018, pp. 3733--3742.","journal-title":"Proceedings of the IEEE conference on computer vision and pattern recognition"},{"key":"e_1_3_2_1_26_1","volume-title":"Learning deep representations by mutual information estimation and maximization,\" arXiv preprint arXiv:1808.06670","author":"Hjelm R. D.","year":"2018","unstructured":"R. D. Hjelm, A. Fedorov, S. Lavoie-Marchildon, K. Grewal, P. Bachman, A. Trischler, and Y. Bengio, \"Learning deep representations by mutual information estimation and maximization,\" arXiv preprint arXiv:1808.06670, 2018."},{"key":"e_1_3_2_1_27_1","first-page":"1597","volume-title":"PMLR","author":"Chen T.","year":"2020","unstructured":"T. Chen, S. Kornblith, M. Norouzi, and G. Hinton, \"A simple framework for contrastive learning of visual representations,\" in International conference on machine learning. PMLR, 2020, pp. 1597--1607."},{"key":"e_1_3_2_1_28_1","first-page":"661","article-title":"Supervised contrastive learning","volume":"33","author":"Khosla P.","year":"2020","unstructured":"P. Khosla, P. Teterwak, C. Wang, A. Sarna, Y. Tian, P. Isola, A. Maschinot, C. Liu, and D. Krishnan, \"Supervised contrastive learning,\" Advances in Neural Information Processing Systems, vol. 33, pp. 18 661--18 673, 2020.","journal-title":"Advances in Neural Information Processing Systems"},{"key":"e_1_3_2_1_29_1","volume-title":"A gpu performance evaluation,\" arXiv preprint arXiv:1412.7580","author":"Vasilache N.","year":"2014","unstructured":"N. Vasilache, J. Johnson, M. Mathieu, S. Chintala, S. Piantino, and Y. LeCun, \"Fast convolutional nets with fbfft: A gpu performance evaluation,\" arXiv preprint arXiv:1412.7580, 2014."},{"key":"e_1_3_2_1_30_1","first-page":"271","volume-title":"IEEE","author":"Banerjee S.","year":"2013","unstructured":"S. Banerjee, Z. Li, and S. R. Nassif, \"Iccad-2013 cad contest in mask optimization and benchmark suite,\" in 2013 IEEE\/ACM International Conference on Computer-Aided Design (ICCAD). IEEE, 2013, pp. 271--274."},{"key":"e_1_3_2_1_31_1","volume-title":"Openroad: Toward a self-driving, open-source digital layout implementation tool chain,\" in Proceedings of Government Microcircuit Applications and Critical Technology Conference","author":"Ajayi T.","year":"2019","unstructured":"T. Ajayi and D. Blaauw, \"Openroad: Toward a self-driving, open-source digital layout implementation tool chain,\" in Proceedings of Government Microcircuit Applications and Critical Technology Conference, 2019."}],"event":{"name":"ICCAD '22: IEEE\/ACM International Conference on Computer-Aided Design","location":"San Diego California","acronym":"ICCAD '22","sponsor":["SIGDA ACM Special Interest Group on Design Automation","IEEE-EDS Electronic Devices Society","IEEE CAS","IEEE CEDA"]},"container-title":["Proceedings of the 41st IEEE\/ACM International Conference on Computer-Aided Design"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3508352.3549468","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/3508352.3549468","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,17]],"date-time":"2025-06-17T19:02:58Z","timestamp":1750186978000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3508352.3549468"}},"subtitle":["A Self-Adaptive Mask Optimization Framework for Real Design Patterns"],"short-title":[],"issued":{"date-parts":[[2022,10,30]]},"references-count":31,"alternative-id":["10.1145\/3508352.3549468","10.1145\/3508352"],"URL":"https:\/\/doi.org\/10.1145\/3508352.3549468","relation":{},"subject":[],"published":{"date-parts":[[2022,10,30]]},"assertion":[{"value":"2022-12-22","order":3,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}