{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T04:13:47Z","timestamp":1750220027718,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":1,"publisher":"ACM","license":[{"start":{"date-parts":[[2023,3,26]],"date-time":"2023-03-26T00:00:00Z","timestamp":1679788800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2023,3,26]]},"DOI":"10.1145\/3569052.3578910","type":"proceedings-article","created":{"date-parts":[[2023,3,22]],"date-time":"2023-03-22T17:51:55Z","timestamp":1679507515000},"page":"104-104","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":1,"title":["Immersion and EUV Lithography"],"prefix":"10.1145","author":[{"ORCID":"https:\/\/orcid.org\/0000-0003-1024-9515","authenticated-orcid":false,"given":"Burn J.","family":"Lin","sequence":"first","affiliation":[{"name":"National Tsing Hua University, Hsinchu, Taiwan Roc"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2023,3,26]]},"reference":[{"edition":"2","volume-title":"\"Optical Lithography; Here is Why\"","key":"e_1_3_2_1_1_1","unstructured":"\"Optical Lithography; Here is Why\" 2nd Edition, Burn J. Lin, SPIE Press 2021, ISBM 9781510639939"}],"event":{"name":"ISPD '23: International Symposium on Physical Design","sponsor":["SIGDA ACM Special Interest Group on Design Automation"],"location":"Virtual Event USA","acronym":"ISPD '23"},"container-title":["Proceedings of the 2023 International Symposium on Physical Design"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3569052.3578910","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/3569052.3578910","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,17]],"date-time":"2025-06-17T17:51:41Z","timestamp":1750182701000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3569052.3578910"}},"subtitle":["Two Pillars to Sustain Single-Digit Nanometer Nodes"],"short-title":[],"issued":{"date-parts":[[2023,3,26]]},"references-count":1,"alternative-id":["10.1145\/3569052.3578910","10.1145\/3569052"],"URL":"https:\/\/doi.org\/10.1145\/3569052.3578910","relation":{},"subject":[],"published":{"date-parts":[[2023,3,26]]},"assertion":[{"value":"2023-03-26","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}