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This paper introduces an efficient mask rule checking approach that utilizes a representative edge sampling scheme. The representative edge sampling scheme selects a subset of edges and points of each polygon that capture its contour, meanwhile greatly reducing the number of edges involved in actual checking. Experimental results demonstrate that the proposed approach achieves significant speedup compared with the state-of-the-art academic tool.<\/jats:p>","DOI":"10.1145\/3723044","type":"journal-article","created":{"date-parts":[[2025,3,17]],"date-time":"2025-03-17T11:26:21Z","timestamp":1742210781000},"update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":2,"title":["EasyMRC: Efficient Mask Rule Checking via Representative Edge Sampling"],"prefix":"10.1145","author":[{"ORCID":"https:\/\/orcid.org\/0009-0009-2366-7557","authenticated-orcid":false,"given":"Jiahao","family":"Xu","sequence":"first","affiliation":[{"name":"The Chinese University of Hong Kong,  Hong Kong, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0009-0009-4909-6588","authenticated-orcid":false,"given":"Zhuolun","family":"He","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong,  Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-4927-0194","authenticated-orcid":false,"given":"Shuo","family":"Yin","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong,  Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1322-5642","authenticated-orcid":false,"given":"Yuan","family":"Pu","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong,  Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-4897-7251","authenticated-orcid":false,"given":"Wenjian","family":"Yu","sequence":"additional","affiliation":[{"name":"Tsinghua University,  Beijing, China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6406-4810","authenticated-orcid":false,"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"CSE, The Chinese University of Hong Kong, Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2025,3,17]]},"reference":[{"key":"e_1_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.633850"},{"key":"e_1_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.410681"},{"key":"e_1_2_1_3_1","volume-title":"Photomask Technology","author":"Moore Bill","year":"2006","unstructured":"Bill Moore, Tanya Do, and Ray\u00a0E Morgan. 2006. 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