{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,2]],"date-time":"2026-01-02T07:47:10Z","timestamp":1767340030807,"version":"3.41.0"},"reference-count":44,"publisher":"Association for Computing Machinery (ACM)","issue":"4","license":[{"start":{"date-parts":[[2025,6,5]],"date-time":"2025-06-05T00:00:00Z","timestamp":1749081600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":["ACM Trans. Des. Autom. Electron. Syst."],"published-print":{"date-parts":[[2025,7,31]]},"abstract":"<jats:p>With the rapid development of semiconductors, the size of transistors is continuously scaling down. The shrinking circuit size poses great challenges to optical proximity correction (OPC) and hotspot detection (HSD). Recent advancements in OPC and HSD commonly employ deep neural networks, achieving impressive performance within a limited runtime. Based on these achievements, we observe that deep-learning-based models of both HSD and OPC require knowledge of layout structure information. Furthermore, these two tasks are closely related to the lithography process during chip manufacturing. Observing such strong relationships, we propose that integrating OPC and HSD into a unified deep learning model will contribute to the performance of both tasks. To bridge the relationship between OPC and HSD, we first pre-train a layout understanding model built on the mask modeling technique, which effectively captures the layout geometric information, and then the pre-trained model can be easily fine-tuned on HSD and OPC with limited data. To fully pre-train the layout understanding model (LUM), we create a large layout dataset using layout generation techniques, solving the data-hungry issues. Experimental results show that the fine-tuned LUM model achieves remarkable performance on both OPC and HSD tasks.<\/jats:p>","DOI":"10.1145\/3728468","type":"journal-article","created":{"date-parts":[[2025,4,4]],"date-time":"2025-04-04T11:09:15Z","timestamp":1743764955000},"page":"1-20","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":1,"title":["Bridging Hotspot Detection and Mask Optimization via Domain-Crossing Masked Layout Modeling"],"prefix":"10.1145","volume":"30","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-8625-1502","authenticated-orcid":false,"given":"Binwu","family":"Zhu","sequence":"first","affiliation":[{"name":"Southeast University, Nanjing, China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1159-1611","authenticated-orcid":false,"given":"Su","family":"Zheng","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Hong Kong, Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3612-4182","authenticated-orcid":false,"given":"Yuzhe","family":"Ma","sequence":"additional","affiliation":[{"name":"Hong Kong University of Science and Technology (Guangzhou), Guangzhou China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6406-4810","authenticated-orcid":false,"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"The Chinese University of Hong Kong, Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8274-9688","authenticated-orcid":false,"given":"Martin","family":"Wong","sequence":"additional","affiliation":[{"name":"Hong Kong Baptist University, Hong Kong Hong Kong"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2025,6,5]]},"reference":[{"key":"e_1_3_2_2_2","doi-asserted-by":"publisher","DOI":"10.1080\/14786447908639684"},{"key":"e_1_3_2_3_2","doi-asserted-by":"publisher","DOI":"10.1145\/2593069.2593163"},{"key":"e_1_3_2_4_2","doi-asserted-by":"crossref","unstructured":"Vivek Bakshi. 2009. EUV lithography. (2009).","DOI":"10.1117\/3.769214"},{"key":"e_1_3_2_5_2","doi-asserted-by":"publisher","DOI":"10.1364\/OE.17.023690"},{"key":"e_1_3_2_6_2","doi-asserted-by":"publisher","DOI":"10.1364\/OE.19.005511"},{"key":"e_1_3_2_7_2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2017.8203763"},{"key":"e_1_3_2_8_2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD51958.2021.9643464"},{"key":"e_1_3_2_9_2","doi-asserted-by":"publisher","DOI":"10.23919\/DATE51398.2021.9474212"},{"key":"e_1_3_2_10_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2019.2939329"},{"key":"e_1_3_2_11_2","article-title":"Neural-ILT 2.0: Migrating ILT to domain-specific and multitask-enabled neural network","author":"Jiang Bentian","year":"2021","unstructured":"Bentian Jiang, Lixin Liu, Yuzhe Ma, Bei Yu, and Evangeline F. Y. Young. 2021. Neural-ILT 2.0: Migrating ILT to domain-specific and multitask-enabled neural network. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems (TCAD) 41, 8 (2021), 2671\u20132684.","journal-title":"IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems (TCAD)"},{"key":"e_1_3_2_12_2","article-title":"L2O-ILT: Learning to optimize inverse lithography techniques","author":"Zhu Binwu","year":"2023","unstructured":"Binwu Zhu, Su Zheng, Ziyang Yu, Guojin Chen, Yuzhe Ma, Fan Yang, Bei Yu, and Martin D. F. Wong. 2023. L2O-ILT: Learning to optimize inverse lithography techniques. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems (TCAD) 43, 3 (2023), 944\u2013955.","journal-title":"IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems (TCAD)"},{"key":"e_1_3_2_13_2","article-title":"RL-OPC: Mask optimization with deep reinforcement learning","author":"Liang Xiaoxiao","year":"2023","unstructured":"Xiaoxiao Liang, Yikang Ouyang, Haoyu Yang, Bei Yu, and Yuzhe Ma. 2023. RL-OPC: Mask optimization with deep reinforcement learning. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems 43, 1 (2023), 340\u2013351.","journal-title":"IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems"},{"key":"e_1_3_2_14_2","doi-asserted-by":"publisher","DOI":"10.1145\/3489517.3530579"},{"key":"e_1_3_2_15_2","doi-asserted-by":"publisher","DOI":"10.1109\/DAC56929.2023.10247704"},{"key":"e_1_3_2_16_2","doi-asserted-by":"publisher","DOI":"10.1117\/12.3009980"},{"key":"e_1_3_2_17_2","doi-asserted-by":"publisher","DOI":"10.1145\/3422622"},{"key":"e_1_3_2_18_2","doi-asserted-by":"crossref","unstructured":"Andrew B. Kahng Chul-Hong Park and Xu Xu. 2006. Fast dual graph based hotspot detection. In Proceedings of Society of Photo-Optical Instrumentation Engineers (SPIE) Vol. 6349 2006.","DOI":"10.1117\/12.692949"},{"key":"e_1_3_2_19_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2014.2351273"},{"key":"e_1_3_2_20_2","doi-asserted-by":"publisher","DOI":"10.1145\/2228360.2228576"},{"key":"e_1_3_2_21_2","doi-asserted-by":"publisher","DOI":"10.1117\/1.JMM.14.1.011003"},{"key":"e_1_3_2_22_2","first-page":"201","volume-title":"Design-process-technology Co-optimization for Manufacturability IX","author":"Matsunawa Tetsuaki","year":"2015","unstructured":"Tetsuaki Matsunawa, Jhih-Rong Gao, Bei Yu, and David Z. Pan. 2015. A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction. In Design-process-technology Co-optimization for Manufacturability IX, Vol. 9427. SPIE, 201\u2013211."},{"key":"e_1_3_2_23_2","doi-asserted-by":"publisher","DOI":"10.1145\/3061639.3062270"},{"key":"e_1_3_2_24_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015903"},{"key":"e_1_3_2_25_2","doi-asserted-by":"publisher","DOI":"10.1145\/3400302.3415661"},{"key":"e_1_3_2_26_2","doi-asserted-by":"publisher","DOI":"10.1145\/3316781.3317824"},{"key":"e_1_3_2_27_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015918"},{"key":"e_1_3_2_28_2","doi-asserted-by":"publisher","DOI":"10.1145\/2429384.2429457"},{"key":"e_1_3_2_29_2","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR52688.2022.01553"},{"key":"e_1_3_2_30_2","unstructured":"Alec Radford Karthik Narasimhan Tim Salimans and Ilya Sutskever. 2018. Improving language understanding by generative pre-training. OpenAI 2018."},{"key":"e_1_3_2_31_2","doi-asserted-by":"publisher","DOI":"10.1109\/WACV56688.2023.00201"},{"key":"e_1_3_2_32_2","first-page":"4171","volume-title":"Annual Conference of the North American Chapter of the Association for Computational Linguistics (NAACL\u201919)","author":"Kenton Jacob Devlin Ming-Wei Chang","year":"2019","unstructured":"Jacob Devlin Ming-Wei Chang Kenton and Lee Kristina Toutanova. 2019. BERT: Pre-training of deep bidirectional transformers for language understanding. In Annual Conference of the North American Chapter of the Association for Computational Linguistics (NAACL\u201919). 4171\u20134186."},{"key":"e_1_3_2_33_2","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR52688.2022.00943"},{"key":"e_1_3_2_34_2","first-page":"5998","volume-title":"Annual Conference on Neural Information Processing Systems (NIPS\u201917)","author":"Vaswani Ashish","year":"2017","unstructured":"Ashish Vaswani, Noam Shazeer, Niki Parmar, Jakob Uszkoreit, Llion Jones, Aidan N. Gomez, \u0141ukasz Kaiser, and Illia Polosukhin. 2017. Attention is all you need. In Annual Conference on Neural Information Processing Systems (NIPS\u201917). 5998\u20136008."},{"volume-title":"International Conference on Learning Representations (ICLR)","author":"Dosovitskiy Alexey","key":"e_1_3_2_35_2","unstructured":"Alexey Dosovitskiy, Lucas Beyer, Alexander Kolesnikov, Dirk Weissenborn, Xiaohua Zhai, Thomas Unterthiner, Mostafa Dehghani, Matthias Minderer, Georg Heigold, Sylvain Gelly, et\u00a0al. n.d. An image is worth 16x16 words: Transformers for image recognition at scale. In International Conference on Learning Representations (ICLR)."},{"key":"e_1_3_2_36_2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCV48922.2021.00986"},{"key":"e_1_3_2_37_2","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2017.106"},{"key":"e_1_3_2_38_2","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2017.660"},{"key":"e_1_3_2_39_2","article-title":"Pytorch: An imperative style, high-performance deep learning library","author":"Paszke Adam","year":"2019","unstructured":"Adam Paszke, Sam Gross, Francisco Massa, Adam Lerer, James Bradbury, Gregory Chanan, Trevor Killeen, Zeming Lin, Natalia Gimelshein, Luca Antiga, et\u00a0al. 2019. Pytorch: An imperative style, high-performance deep learning library. arXiv preprint arXiv:1912.01703 (2019).","journal-title":"arXiv preprint arXiv:1912.01703"},{"key":"e_1_3_2_40_2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691131"},{"key":"e_1_3_2_41_2","article-title":"LithoBench: Benchmarking AI computational lithography for semiconductor manufacturing","volume":"36","author":"Zheng Su","year":"2024","unstructured":"Su Zheng, Haoyu Yang, Binwu Zhu, Bei Yu, and Martin Wong. 2024. LithoBench: Benchmarking AI computational lithography for semiconductor manufacturing. Annual Conference on Neural Information Processing Systems (NeurIPS) 36 (2024).","journal-title":"Annual Conference on Neural Information Processing Systems (NeurIPS)"},{"key":"e_1_3_2_42_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2018.2837078"},{"key":"e_1_3_2_43_2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD51958.2021.9643590"},{"key":"e_1_3_2_44_2","doi-asserted-by":"publisher","DOI":"10.1145\/2593069.2593163"},{"key":"e_1_3_2_45_2","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2023.3239559"}],"container-title":["ACM Transactions on Design Automation of Electronic Systems"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3728468","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/3728468","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,19]],"date-time":"2025-06-19T01:18:36Z","timestamp":1750295916000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/3728468"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,6,5]]},"references-count":44,"journal-issue":{"issue":"4","published-print":{"date-parts":[[2025,7,31]]}},"alternative-id":["10.1145\/3728468"],"URL":"https:\/\/doi.org\/10.1145\/3728468","relation":{},"ISSN":["1084-4309","1557-7309"],"issn-type":[{"type":"print","value":"1084-4309"},{"type":"electronic","value":"1557-7309"}],"subject":[],"published":{"date-parts":[[2025,6,5]]},"assertion":[{"value":"2024-11-01","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"2025-03-28","order":2,"name":"accepted","label":"Accepted","group":{"name":"publication_history","label":"Publication History"}},{"value":"2025-06-05","order":3,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}