{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,5,4]],"date-time":"2026-05-04T20:39:09Z","timestamp":1777927149763,"version":"3.51.4"},"reference-count":11,"publisher":"SAGE Publications","issue":"7","license":[{"start":{"date-parts":[[2018,4,2]],"date-time":"2018-04-02T00:00:00Z","timestamp":1522627200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/journals.sagepub.com\/page\/policies\/text-and-data-mining-license"}],"funder":[{"name":"Foundation of the National Science and Technology Major Project of China","award":["2012ZX02702-006"],"award-info":[{"award-number":["2012ZX02702-006"]}]}],"content-domain":{"domain":["journals.sagepub.com"],"crossmark-restriction":true},"short-container-title":["Proceedings of the Institution of Mechanical Engineers, Part I: Journal of Systems and Control Engineering"],"published-print":{"date-parts":[[2018,8]]},"abstract":"<jats:p>The stage yaw error is a key factor affecting the phase distortion of gratings produced by scanning beam interference lithography system. In order to solve this problem, a coarse-fine dual-stage mechanism is proposed, in which an ultra-precision fine positioning stage with yaw error correction function is developed. To achieve nanoscale positioning and sub-microradian yaw motion accuracy, four Lorentz motors are used to drive the fine stage. The internal coupling factors and the mechanism of Lorentz motors motion control are analyzed. Besides, the Abbe error caused by the yaw error is investigated. Positioning and scanning experiments are conducted and the outcomes show that maximum yaw error is 0.33\u2009\u03bcrad during constant velocity scanning, which completely meets the grating fabrication requirements.<\/jats:p>","DOI":"10.1177\/0959651818766197","type":"journal-article","created":{"date-parts":[[2018,4,3]],"date-time":"2018-04-03T02:16:15Z","timestamp":1522721775000},"page":"869-878","update-policy":"https:\/\/doi.org\/10.1177\/sage-journals-update-policy","source":"Crossref","is-referenced-by-count":0,"title":["Yaw error correction of ultra-precision stage for scanning beam interference lithography systems"],"prefix":"10.1177","volume":"232","author":[{"given":"Sen","family":"Lu","sequence":"first","affiliation":[{"name":"State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing, China"},{"name":"Beijing Key Laboratory of Precision\/Ultra-precision Manufacturing Equipments and Control, Department of Mechanical Engineering, 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