{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,11]],"date-time":"2026-09-11T04:50:52Z","timestamp":1789102252396,"version":"build-2803163510"},"reference-count":25,"publisher":"Optica Publishing Group","issue":"30","license":[{"start":{"date-parts":[[2025,10,10]],"date-time":"2025-10-10T00:00:00Z","timestamp":1760054400000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/doi.org\/10.1364\/OA_License_v2#VOR"},{"start":{"date-parts":[[2025,10,10]],"date-time":"2025-10-10T00:00:00Z","timestamp":1760054400000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/opg.optica.org\/policies\/opg-tdm-policy.json"}],"funder":[{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","award":["52441510"],"award-info":[{"award-number":["52441510"]}],"id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["opg.optica.org"],"crossmark-restriction":false},"short-container-title":["Appl. Opt."],"published-print":{"date-parts":[[2025,10,20]]},"abstract":"<jats:p>High-precision wafer alignment is a key technology for achieving high overlay accuracy in advanced-node semiconductor manufacturing. In immersion, extreme ultraviolet (EUV), and high-NA EUV lithography, asymmetry in alignment mark structures, introduced by processes, such as chemical\u2013mechanical polishing, is a primary cause of alignment position deviation (APD), which significantly degrades overlay accuracy. To address this issue at its root, this paper presents a systematic design methodology for segmented grating alignment marks based on multi-objective optimization. The mark geometry is parameterized and coupled with finite-difference time-domain simulations. A non-dominated sorting genetic algorithm (NSGA-II) is employed to simultaneously maximize diffraction efficiency and minimize APD under asymmetric deformation. Optimization results for two design examples confirm the effectiveness and feasibility of the proposed approach.<\/jats:p>","DOI":"10.1364\/ao.575552","type":"journal-article","created":{"date-parts":[[2025,9,18]],"date-time":"2025-09-18T13:00:09Z","timestamp":1758200409000},"page":"8921","update-policy":"https:\/\/doi.org\/10.1364\/crossmark_policy","source":"Crossref","is-referenced-by-count":1,"title":["Design method for wafer alignment marks  with low alignment position deviation under process-induced asymmetry"],"prefix":"10.1364","volume":"64","author":[{"given":"Lijun","family":"Zhou","sequence":"first","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xiangzhao","family":"Wang","sequence":"additional","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Zhongliang","family":"Li","sequence":"additional","affiliation":[{"name":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Peng","family":"Feng","sequence":"additional","affiliation":[{"name":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xuan","family":"Zhuo","sequence":"additional","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jinming","family":"Gao","sequence":"additional","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-2463-832X","authenticated-orcid":true,"given":"Dong","family":"Liu","sequence":"additional","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Lan","family":"Wu","sequence":"additional","affiliation":[{"name":"Zhejiang University"},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"285","published-online":{"date-parts":[[2025,10,10]]},"reference":[{"key":"ao-64-30-8921-R1","doi-asserted-by":"publisher","first-page":"023001","DOI":"10.1088\/2051-672X\/4\/2\/023001","type":"journal-article","volume":"4","author":"Boef","year":"2016","journal-title":"Surf. Topogr. Metrol. Prop."},{"key":"ao-64-30-8921-R2","doi-asserted-by":"crossref","first-page":"071204","DOI":"10.3788\/COL202321.071204","type":"journal-article","volume":"21","author":"Yang","year":"2023","journal-title":"Chin. Opt. Lett."},{"key":"ao-64-30-8921-R3","doi-asserted-by":"publisher","first-page":"69220O","DOI":"10.1117\/12.772516","type":"journal-article","volume":"6922","author":"Leray","year":"2008","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R4","doi-asserted-by":"publisher","first-page":"65180H","DOI":"10.1117\/12.711059","type":"journal-article","volume":"6518","author":"Miyasaka","year":"2007","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R5","doi-asserted-by":"publisher","first-page":"1247843","DOI":"10.1117\/12.2654908","type":"journal-article","volume":"12478","author":"Jin","year":"2022","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R7","doi-asserted-by":"publisher","first-page":"109610A","DOI":"10.1117\/12.2516259","type":"journal-article","volume":"10961","author":"Jeong","year":"2019","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R8","doi-asserted-by":"publisher","first-page":"752023","DOI":"10.1117\/12.839816","type":"journal-article","volume":"7520","author":"Wang","year":"2009","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R9","doi-asserted-by":"publisher","first-page":"876907","DOI":"10.1117\/12.2021169","type":"journal-article","volume":"8769","author":"Boef","year":"2013","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R10","doi-asserted-by":"publisher","first-page":"918","DOI":"10.1117\/12.482814","type":"journal-article","volume":"5038","author":"Huijbregtse","year":"2003","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R11","doi-asserted-by":"publisher","first-page":"520","DOI":"10.1117\/12.389040","type":"journal-article","volume":"4000","author":"Bornebroek","year":"2000","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R12","doi-asserted-by":"publisher","first-page":"948","DOI":"10.1117\/12.599090","type":"journal-article","volume":"5752","author":"Keij","year":"2005","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R13","doi-asserted-by":"publisher","first-page":"105870C","DOI":"10.1117\/12.2297493","type":"journal-article","volume":"10587","author":"Menchtchikov","year":"2018","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R14","doi-asserted-by":"publisher","first-page":"10147C","DOI":"10.1117\/12.2259750","type":"journal-article","volume":"10147","author":"Menchtchikov","year":"2017","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R15","doi-asserted-by":"publisher","first-page":"105871G","DOI":"10.1117\/12.2304364","type":"journal-article","volume":"10587","author":"Bouma","year":"2018","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R16","doi-asserted-by":"publisher","first-page":"9","DOI":"10.1364\/AO.58.000009","type":"journal-article","volume":"58","author":"Du","year":"2019","journal-title":"Appl. Opt."},{"key":"ao-64-30-8921-R17","doi-asserted-by":"publisher","first-page":"3805","DOI":"10.3390\/s21113805","type":"journal-article","volume":"21","author":"Yang","year":"2021","journal-title":"Sensors"},{"key":"ao-64-30-8921-R18","doi-asserted-by":"publisher","first-page":"97782M","DOI":"10.1117\/12.2219491","type":"journal-article","volume":"9778","author":"Leray","year":"2016","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R19","doi-asserted-by":"publisher","first-page":"2756","DOI":"10.3390\/s24092756","type":"journal-article","volume":"24","author":"Song","year":"2024","journal-title":"Sensors"},{"key":"ao-64-30-8921-R20","doi-asserted-by":"publisher","first-page":"65181Z","DOI":"10.1117\/12.712149","type":"journal-article","volume":"6518","author":"Megens","year":"2007","journal-title":"Proc. SPIE"},{"key":"ao-64-30-8921-R21","doi-asserted-by":"publisher","first-page":"811","DOI":"10.1364\/JOSA.71.000811","type":"journal-article","volume":"71","author":"Moharam","year":"1981","journal-title":"J. Opt. Soc. Am."},{"key":"ao-64-30-8921-R22","doi-asserted-by":"publisher","first-page":"302","DOI":"10.1109\/TAP.1966.1138693","type":"journal-article","volume":"14","author":"Yee","year":"1966","journal-title":"IEEE Trans. Antennas Propagat."},{"key":"ao-64-30-8921-R23","doi-asserted-by":"publisher","first-page":"182","DOI":"10.1109\/4235.996017","type":"journal-article","volume":"6","author":"Deb","year":"2002","journal-title":"IEEE Trans. Evol. Comput."},{"key":"ao-64-30-8921-R24","doi-asserted-by":"publisher","first-page":"992","DOI":"10.1016\/j.ress.2005.11.018","type":"journal-article","volume":"91","author":"Konak","year":"2006","journal-title":"Reliab. Eng. Syst. Safety"},{"key":"ao-64-30-8921-R25","doi-asserted-by":"publisher","first-page":"173","DOI":"10.1162\/106365600568202","type":"journal-article","volume":"8","author":"Zitzler","year":"2000","journal-title":"Evol. Comput."},{"key":"ao-64-30-8921-R26","doi-asserted-by":"publisher","first-page":"9814","DOI":"10.1364\/AO.57.009814","type":"journal-article","volume":"57","author":"Du","year":"2018","journal-title":"Appl. Opt."}],"container-title":["Applied Optics"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/opg.optica.org\/viewmedia.cfm?URI=ao-64-30-8921&seq=0","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,10,10]],"date-time":"2025-10-10T15:15:35Z","timestamp":1760109335000},"score":1,"resource":{"primary":{"URL":"https:\/\/opg.optica.org\/abstract.cfm?URI=ao-64-30-8921"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,10,10]]},"references-count":25,"journal-issue":{"issue":"30","published-online":{"date-parts":[[2025]]},"published-print":{"date-parts":[[2025]]}},"URL":"https:\/\/doi.org\/10.1364\/ao.575552","relation":{},"ISSN":["1559-128X","2155-3165"],"issn-type":[{"value":"1559-128X","type":"print"},{"value":"2155-3165","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025,10,10]]},"assertion":[{"value":"Optica Publishing Group","name":"publisher","label":"This article is maintained by"},{"value":"https:\/\/doi.org\/10.1364\/AO.575552","name":"articlelink","label":"Crossref DOI link to publisher maintained version"},{"value":"research-article","name":"content_type","label":"Article type"},{"value":"Screened by Similarity Check","name":"cross_check","label":"Similarity check"},{"value":"Yes","order":0,"name":"peer_reviewed","label":"Peer reviewed","group":{"name":"peer_review","label":"Peer review"}},{"value":"Single blind","order":1,"name":"review_process","label":"Review process","group":{"name":"peer_review","label":"Peer review"}},{"value":"4 August 2025","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"18 September 2025","order":1,"name":"accepted","label":"Accepted","group":{"name":"publication_history","label":"Publication History"}},{"value":"10 October 2025","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}},{"value":"\u00a9 2025 Optica Publishing Group. All rights, including for text and data mining (TDM), Artificial Intelligence (AI) training, and similar technologies, are reserved.","name":"copyright","label":"Copyright"}]}}