{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,16]],"date-time":"2026-09-16T22:20:12Z","timestamp":1789597212802,"version":"build-2803163510"},"reference-count":34,"publisher":"Optica Publishing Group","issue":"8","license":[{"start":{"date-parts":[[2025,4,15]],"date-time":"2025-04-15T00:00:00Z","timestamp":1744675200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/doi.org\/10.1364\/OA_License_v2#VOR-OA"},{"start":{"date-parts":[[2025,4,15]],"date-time":"2025-04-15T00:00:00Z","timestamp":1744675200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/opg.optica.org\/policies\/opg-tdm-policy.json"}],"funder":[{"name":"Strategic Priority Research Program of Chinese Academy of Sciences","award":["XDA0330303"],"award-info":[{"award-number":["XDA0330303"]}]},{"name":"Frontier Technology Collaboration Project","award":["QYJS-2023-2900-B"],"award-info":[{"award-number":["QYJS-2023-2900-B"]}]},{"DOI":"10.13039\/501100011332","name":"University of Chinese Academy of Sciences","doi-asserted-by":"publisher","award":["118900M032"],"award-info":[{"award-number":["118900M032"]}],"id":[{"id":"10.13039\/501100011332","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100012226","name":"Fundamental Research Funds for the Central Universities","doi-asserted-by":"publisher","award":["E2ET3801"],"award-info":[{"award-number":["E2ET3801"]}],"id":[{"id":"10.13039\/501100012226","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["opg.optica.org"],"crossmark-restriction":false},"short-container-title":["Opt. Express"],"published-print":{"date-parts":[[2025,4,21]]},"abstract":"<jats:p>\n                    Surface plasmonic lithography (SPL) utilizes the lateral propagation of light on the surface of metals, which generates transverse excitation, resulting in evanescent waves that participate in imaging to break the diffraction limit. However, a challenge is the difficulty in achieving stable evanescent wave imaging. This paper proposes a surface plasmon resonance cavity lithography (SPRCL) technique, which achieves super-resolution imaging and explores the effects of various factors on this technique. The general dispersion relation for surface plasmon polaritons in a double-resonator cavity structure is derived using traditional electromagnetic field theory. Through optical transfer function (OTF) analysis, the essence of the super-resolution imaging phenomenon is revealed\u2014the OTF of the resonator-based super-resolution imaging system exhibits ultra-high transfer efficiency in the high-frequency evanescent wave region. In the numerical simulation, illumination light with a wavelength of 436 nm and a mask with a period of 740 nm were used to successfully obtain a feature size of 26.4 nm (\u223c1\/17 light wavelength) and period of 52.8 nm. This result is smaller than the resolution of a conventional 193 nm immersion lithography machine. Additionally, at wavelengths of 532 nm and 633 nm, this technique achieved a stripe resolution of less than 1\/11 light wavelength, with a lithography contrast greater than 0.9 and a normalized image log-slope (NILS) greater than 1.6. Analysis indicates that parameters including the mask duty cycle, incident angle, SiO\n                    <jats:sub>2<\/jats:sub>\n                    thickness of the photoresist (PR) upper layer, and PR layer thickness significantly influence super-resolution imaging performance. Notably, the PR layer thickness enables optical resolution tuning without altering metal grating dimensions. Compared with traditional plasmonic lithography, this approach demonstrates enhanced pattern uniformity and contrast while exhibiting improved process robustness against parameter variations.\n                  <\/jats:p>","DOI":"10.1364\/oe.559423","type":"journal-article","created":{"date-parts":[[2025,4,3]],"date-time":"2025-04-03T04:00:35Z","timestamp":1743652835000},"page":"17976","update-policy":"https:\/\/doi.org\/10.1364\/crossmark_policy","source":"Crossref","is-referenced-by-count":11,"title":["Super-resolution imaging using surface plasmon resonance cavity lithography"],"prefix":"10.1364","volume":"33","author":[{"ORCID":"https:\/\/orcid.org\/0009-0001-4798-7864","authenticated-orcid":true,"given":"Dinghai","family":"Rui","sequence":"first","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-7754-483X","authenticated-orcid":true,"given":"LiBin","family":"Zhang","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1710-6103","authenticated-orcid":true,"given":"Huwen","family":"Ding","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Hao","family":"Shen","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yayi","family":"Wei","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yajuan","family":"Su","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/034t30j35","id-type":"ROR","asserted-by":"publisher"}]},{"name":"Institute of Microelectronics of Chinese Academy of Sciences"},{"name":"University of Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"285","published-online":{"date-parts":[[2025,4,15]]},"reference":[{"key":"oe-33-8-17976-R1","first-page":"5","author":"Ma","year":"2010"},{"key":"oe-33-8-17976-R2","doi-asserted-by":"publisher","first-page":"042601","DOI":"10.1116\/6.0003693","volume":"42","author":"Rui","year":"2024","journal-title":"J. Vacuum Sci. Technol. B"},{"key":"oe-33-8-17976-R3","doi-asserted-by":"publisher","first-page":"108536","DOI":"10.1016\/j.optlaseng.2024.108536","volume":"183","author":"Aflalo","year":"2024","journal-title":"Opt. Lasers Eng."},{"key":"oe-33-8-17976-R4","doi-asserted-by":"publisher","first-page":"435","DOI":"10.2494\/photopolymer.18.435","volume":"18","author":"Ito","year":"2005","journal-title":"J. Photopolym. Sci. Technol."},{"key":"oe-33-8-17976-R5","doi-asserted-by":"publisher","first-page":"118","DOI":"10.3390\/mi7070118","volume":"7","author":"Wang","year":"2016","journal-title":"Micromachines"},{"key":"oe-33-8-17976-R6","doi-asserted-by":"publisher","first-page":"534","DOI":"10.1126\/science.1108759","volume":"308","author":"Fang","year":"2005","journal-title":"Science"},{"key":"oe-33-8-17976-R7","doi-asserted-by":"publisher","first-page":"2702","DOI":"10.1364\/JOSAB.538952","volume":"41","author":"Rui","year":"2024","journal-title":"J. Opt. Soc. Am. B"},{"key":"oe-33-8-17976-R8","doi-asserted-by":"publisher","first-page":"093110","DOI":"10.1063\/1.4914000","volume":"106","author":"Gao","year":"2015","journal-title":"Appl. Phys. Lett."},{"key":"oe-33-8-17976-R9","doi-asserted-by":"publisher","first-page":"27115","DOI":"10.1364\/OE.24.027115","volume":"24","author":"Zhao","year":"2016","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R10","doi-asserted-by":"publisher","first-page":"15982","DOI":"10.1364\/OE.19.015982","volume":"19","author":"Yao","year":"2011","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R11","doi-asserted-by":"publisher","first-page":"169199","DOI":"10.1016\/j.ijleo.2022.169199","volume":"261","author":"Song","year":"2022","journal-title":"Optik"},{"key":"oe-33-8-17976-R12","doi-asserted-by":"publisher","first-page":"671","DOI":"10.1038\/nature05147","volume":"443","author":"Aoki","year":"2006","journal-title":"Nature"},{"key":"oe-33-8-17976-R13","doi-asserted-by":"publisher","first-page":"879","DOI":"10.1109\/LPT.2020.3003015","volume":"32","author":"Hedger","year":"2020","journal-title":"IEEE Photonics Technol. Lett."},{"key":"oe-33-8-17976-R14","doi-asserted-by":"publisher","first-page":"2132","DOI":"10.1109\/LAWP.2020.3024640","volume":"19","author":"Li","year":"2020","journal-title":"Antennas Wirel. Propag. Lett."},{"key":"oe-33-8-17976-R15","doi-asserted-by":"publisher","first-page":"125612","DOI":"10.1088\/2040-8978\/17\/12\/125612","volume":"17","author":"Weismann","year":"2015","journal-title":"J. Opt."},{"key":"oe-33-8-17976-R16","doi-asserted-by":"publisher","first-page":"1725","DOI":"10.1016\/j.ssc.2011.09.002","volume":"151","author":"Degl\u2019Innocenti","year":"2011","journal-title":"Solid State Commun."},{"key":"oe-33-8-17976-R17","author":"Mack","year":"2007"},{"key":"oe-33-8-17976-R18","doi-asserted-by":"publisher","first-page":"1474","DOI":"10.1109\/T-ED.1983.21326","volume":"30","author":"Oldham","year":"1983","journal-title":"IEEE Trans. Electron Devices"},{"key":"oe-33-8-17976-R19","author":"Levinson","year":"2019"},{"key":"oe-33-8-17976-R20","doi-asserted-by":"publisher","first-page":"6714","DOI":"10.1364\/OE.19.006714","volume":"19","author":"Ge","year":"2011","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R21","doi-asserted-by":"publisher","first-page":"21560","DOI":"10.1364\/OE.17.021560","volume":"17","author":"Yang","year":"2009","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R22","doi-asserted-by":"publisher","first-page":"14260","DOI":"10.1364\/OE.17.014260","volume":"17","author":"Moore","year":"2009","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R23","doi-asserted-by":"publisher","first-page":"33869","DOI":"10.1364\/OE.465650","volume":"30","author":"Ding","year":"2022","journal-title":"Opt. Express"},{"key":"oe-33-8-17976-R24","author":"Madou","year":"2002"},{"key":"oe-33-8-17976-R25","doi-asserted-by":"publisher","first-page":"3217","DOI":"10.1016\/S0042-6989(96)00262-3","volume":"37","author":"Peli","year":"1997","journal-title":"Vision Res."},{"key":"oe-33-8-17976-R26","doi-asserted-by":"publisher","first-page":"5618","DOI":"10.1038\/srep05618","volume":"4","author":"Dong","year":"2014","journal-title":"Sci. Rep."},{"key":"oe-33-8-17976-R27","doi-asserted-by":"publisher","first-page":"256","DOI":"10.1364\/OPTCON.513843","volume":"3","author":"Long","year":"2024","journal-title":"Opt. Continuum"},{"key":"oe-33-8-17976-R28","doi-asserted-by":"publisher","first-page":"05L","DOI":"10.1088\/1361-6528\/ad0591","volume":"35","author":"Zhang","year":"2024","journal-title":"Nanotechnology"},{"key":"oe-33-8-17976-R29","doi-asserted-by":"publisher","first-page":"112536","DOI":"10.1016\/j.optmat.2022.112536","volume":"130","author":"Hu","year":"2022","journal-title":"Opt. Mater."},{"key":"oe-33-8-17976-R30","doi-asserted-by":"publisher","first-page":"135103","DOI":"10.1088\/1361-6463\/ab6430","volume":"53","author":"Liu","year":"2020","journal-title":"J. Phys. D: Appl. Phys."},{"key":"oe-33-8-17976-R31","doi-asserted-by":"publisher","first-page":"623","DOI":"10.1007\/s11468-019-01069-7","volume":"15","author":"Qian","year":"2020","journal-title":"Plasmonics"},{"key":"oe-33-8-17976-R32","doi-asserted-by":"publisher","first-page":"3051","DOI":"10.1364\/OME.409305","volume":"10","author":"Du","year":"2020","journal-title":"Opt. Mater. Express"},{"key":"oe-33-8-17976-R33","doi-asserted-by":"publisher","first-page":"103729","DOI":"10.1016\/j.rinp.2020.103729","volume":"20","author":"Dong","year":"2021","journal-title":"Results Phys."},{"key":"oe-33-8-17976-R34","doi-asserted-by":"publisher","first-page":"20511","DOI":"10.1364\/OE.25.020511","volume":"25","author":"Liu","year":"2017","journal-title":"Opt. Express"}],"container-title":["Optics Express"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/opg.optica.org\/viewmedia.cfm?URI=oe-33-8-17976&seq=0","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,4,15]],"date-time":"2025-04-15T15:21:47Z","timestamp":1744730507000},"score":1,"resource":{"primary":{"URL":"https:\/\/opg.optica.org\/abstract.cfm?URI=oe-33-8-17976"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,4,15]]},"references-count":34,"journal-issue":{"issue":"8","published-online":{"date-parts":[[2025]]},"published-print":{"date-parts":[[2025]]}},"URL":"https:\/\/doi.org\/10.1364\/oe.559423","relation":{},"ISSN":["1094-4087"],"issn-type":[{"value":"1094-4087","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025,4,15]]},"assertion":[{"value":"Optica Publishing Group","name":"publisher","label":"This article is maintained by"},{"value":"https:\/\/doi.org\/10.1364\/OE.559423","name":"articlelink","label":"Crossref DOI link to publisher maintained version"},{"value":"research-article","name":"content_type","label":"Article type"},{"value":"Screened by Similarity Check","name":"cross_check","label":"Similarity check"},{"value":"Yes","order":0,"name":"peer_reviewed","label":"Peer reviewed","group":{"name":"peer_review","label":"Peer review"}},{"value":"Single blind","order":1,"name":"review_process","label":"Review process","group":{"name":"peer_review","label":"Peer review"}},{"value":"12 February 2025","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"1 April 2025","order":1,"name":"accepted","label":"Accepted","group":{"name":"publication_history","label":"Publication History"}},{"value":"15 April 2025","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}},{"value":"\u00a9 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement","name":"copyright","label":"Copyright"}]}}