{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,6]],"date-time":"2026-10-06T01:38:31Z","timestamp":1791250711170,"version":"4.1.0"},"reference-count":24,"publisher":"Optica Publishing Group","issue":"22","license":[{"start":{"date-parts":[[2025,10,30]],"date-time":"2025-10-30T00:00:00Z","timestamp":1761782400000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/doi.org\/10.1364\/OA_License_v2#VOR-OA"},{"start":{"date-parts":[[2025,10,30]],"date-time":"2025-10-30T00:00:00Z","timestamp":1761782400000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/opg.optica.org\/policies\/opg-tdm-policy.json"}],"funder":[{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","award":["52441510"],"award-info":[{"award-number":["52441510"]}],"id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["opg.optica.org"],"crossmark-restriction":false},"short-container-title":["Opt. Express"],"published-print":{"date-parts":[[2025,11,3]]},"abstract":"<jats:p>\n                    Overlay accuracy is a core performance metric for lithography systems. To achieve high overlay accuracy during integrated circuit manufacturing, high-performance wafer alignment is a critical enabling technology. Developing rapid and high-precision wafer alignment techniques is therefore of paramount importance. While alignment schemes based on phase grating can achieve high-precision alignment measurement, as demonstrated by ASML\u2019s series of alignment technologies that meet the requirements for immersion, EUV, and even high-NA EUV lithography, this paper proposes an alternative optical measurement scheme based on vortex beam interferometry for high-precision wafer alignment. The approach converts the \u00b11st diffraction orders from a grating into vortex beams with opposite topological charges. The lateral displacement of the grating is linearly transduced into the rotation of a resulting petal-like interference pattern. We established a theoretical model for this displacement-to-angle conversion and experimentally validated its performance. Under simple laboratory conditions, the measured displacement showed a coefficient of determination (R\n                    <jats:sup>2<\/jats:sup>\n                    ) exceeding 0.999 for a linear fit over a 1\u2005\u03bcm range, and a measurement repeatability (standard deviation) better than 1.8\u2005nm. This work offers a precise solution for real-time position sensing with significant potential for DUV and EUV lithography wafer alignment.\n                  <\/jats:p>","DOI":"10.1364\/oe.573583","type":"journal-article","created":{"date-parts":[[2025,10,17]],"date-time":"2025-10-17T06:00:08Z","timestamp":1760680808000},"page":"47218","update-policy":"https:\/\/doi.org\/10.1364\/crossmark_policy","source":"Crossref","is-referenced-by-count":4,"title":["Wafer alignment measurement in lithography systems based on vortex beam interference"],"prefix":"10.1364","volume":"33","author":[{"given":"Lijun","family":"Zhou","sequence":"first","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xiangzhao","family":"Wang","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Zhongliang","family":"Li","sequence":"additional","affiliation":[{"name":"Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Peng","family":"Feng","sequence":"additional","affiliation":[{"name":"Chinese Academy of Sciences"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xuan","family":"Zhuo","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jinming","family":"Gao","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-2463-832X","authenticated-orcid":true,"given":"Dong","family":"Liu","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Lan","family":"Wu","sequence":"additional","affiliation":[{"id":[{"id":"https:\/\/ror.org\/00a2xv884","id-type":"ROR","asserted-by":"publisher"}]},{"name":"ZJU-Hangzhou Global Scientific and Technological Innovation Center"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"285","published-online":{"date-parts":[[2025,10,30]]},"reference":[{"key":"oe-33-22-47218-R1","doi-asserted-by":"publisher","first-page":"023001","DOI":"10.1088\/2051-672X\/4\/2\/023001","type":"journal-article","volume":"4","author":"Boef","year":"2016","journal-title":"Surf. Topogr. Metrol. Prop."},{"key":"oe-33-22-47218-R2","doi-asserted-by":"publisher","first-page":"634","DOI":"10.1117\/12.435761","type":"journal-article","volume":"4346","author":"Vleeminga","year":"2001","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R3","doi-asserted-by":"publisher","first-page":"723","DOI":"10.1109\/T-ED.1979.19483","type":"journal-article","volume":"26","author":"Bouwhuis","year":"1979","journal-title":"IEEE Trans. Electron Devices"},{"key":"oe-33-22-47218-R4","doi-asserted-by":"publisher","first-page":"60","DOI":"10.1117\/12.963703","type":"journal-article","volume":"0633","author":"Brink","year":"1986","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R5","doi-asserted-by":"publisher","first-page":"65180H","DOI":"10.1117\/12.711059","type":"journal-article","volume":"6518","author":"Miyasaka","year":"2007","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R6","doi-asserted-by":"publisher","first-page":"255","DOI":"10.1117\/12.2654908","type":"journal-article","volume":"12478","author":"Jin","year":"2022","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R8","doi-asserted-by":"publisher","first-page":"86","DOI":"10.1117\/12.599807","type":"journal-article","volume":"5754","author":"Warrick","year":"2005","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R9","doi-asserted-by":"publisher","first-page":"852","DOI":"10.1117\/12.473411","type":"journal-article","volume":"4689","author":"Opjtz","year":"2002","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R10","doi-asserted-by":"publisher","first-page":"849","DOI":"10.1117\/12.483513","type":"journal-article","volume":"5038","author":"Nagayama","year":"2003","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R11","doi-asserted-by":"publisher","first-page":"876907","DOI":"10.1117\/12.2021169","type":"journal-article","volume":"8769","author":"Boef","year":"2013","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R12","doi-asserted-by":"publisher","first-page":"918","DOI":"10.1117\/12.482814","type":"journal-article","volume":"5038","author":"Huijbregtse","year":"2003","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R13","doi-asserted-by":"publisher","first-page":"520","DOI":"10.1117\/12.389040","type":"journal-article","volume":"4000","author":"Bornebroek","year":"2000","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R14","doi-asserted-by":"publisher","first-page":"948","DOI":"10.1117\/12.599090","type":"journal-article","volume":"5752","author":"Keij","year":"2005","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R15","doi-asserted-by":"publisher","first-page":"11","DOI":"10.1117\/12.2297493","type":"journal-article","volume":"10587","author":"Menchtchikov","year":"2018","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R16","doi-asserted-by":"publisher","first-page":"101471C","DOI":"10.1117\/12.2259750","type":"journal-article","volume":"10147","author":"Menchtchikov","year":"2017","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R17","doi-asserted-by":"publisher","first-page":"1211","DOI":"10.1117\/12.487734","type":"journal-article","volume":"5038","author":"Tan","year":"2003","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R18","doi-asserted-by":"publisher","first-page":"101471T","DOI":"10.1117\/12.2258128","type":"journal-article","volume":"10147","author":"Samudrala","year":"2017","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R20","doi-asserted-by":"publisher","first-page":"752023","DOI":"10.1117\/12.839816","type":"journal-article","volume":"7520","author":"Wang","year":"2009","journal-title":"Proc. SPIE"},{"key":"oe-33-22-47218-R21","doi-asserted-by":"publisher","first-page":"16144","DOI":"10.1364\/OE.17.016144","type":"journal-article","volume":"17","author":"Masajada","year":"2009","journal-title":"Opt. Express"},{"key":"oe-33-22-47218-R22","doi-asserted-by":"publisher","first-page":"11265","DOI":"10.1364\/OE.25.011265","type":"journal-article","volume":"25","author":"Padgett","year":"2017","journal-title":"Opt. Express"},{"key":"oe-33-22-47218-R23","doi-asserted-by":"publisher","first-page":"120","DOI":"10.1364\/OPEX.14.000120","type":"journal-article","volume":"14","author":"Wang","year":"2006","journal-title":"Opt. Express"},{"key":"oe-33-22-47218-R24","doi-asserted-by":"publisher","first-page":"3594","DOI":"10.1364\/OL.44.003594","type":"journal-article","volume":"44","author":"Verma","year":"2019","journal-title":"Opt. Lett."},{"key":"oe-33-22-47218-R25","doi-asserted-by":"publisher","first-page":"063841","DOI":"10.1103\/PhysRevA.92.063841","type":"journal-article","volume":"92","author":"Plick","year":"2015","journal-title":"Phys. Rev. A"},{"key":"oe-33-22-47218-R26","doi-asserted-by":"publisher","first-page":"52","DOI":"10.1117\/12.2304364","type":"journal-article","volume":"10587","author":"Bouma","year":"2018","journal-title":"Proc. SPIE"}],"container-title":["Optics Express"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/opg.optica.org\/viewmedia.cfm?URI=oe-33-22-47218&seq=0","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2026,5,12]],"date-time":"2026-05-12T19:18:27Z","timestamp":1778613507000},"score":1,"resource":{"primary":{"URL":"https:\/\/opg.optica.org\/abstract.cfm?URI=oe-33-22-47218"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,10,30]]},"references-count":24,"journal-issue":{"issue":"22","published-online":{"date-parts":[[2025]]},"published-print":{"date-parts":[[2025]]}},"URL":"https:\/\/doi.org\/10.1364\/oe.573583","relation":{},"ISSN":["1094-4087"],"issn-type":[{"value":"1094-4087","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025,10,30]]},"assertion":[{"value":"Optica Publishing Group","name":"publisher","label":"This article is maintained by"},{"value":"https:\/\/doi.org\/10.1364\/OE.573583","name":"articlelink","label":"Crossref DOI link to publisher maintained version"},{"value":"research-article","name":"content_type","label":"Article type"},{"value":"Screened by Similarity Check","name":"cross_check","label":"Similarity check"},{"value":"Yes","order":0,"name":"peer_reviewed","label":"Peer reviewed","group":{"name":"peer_review","label":"Peer review"}},{"value":"Single blind","order":1,"name":"review_process","label":"Review process","group":{"name":"peer_review","label":"Peer review"}},{"value":"15 July 2025","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"17 October 2025","order":1,"name":"accepted","label":"Accepted","group":{"name":"publication_history","label":"Publication History"}},{"value":"30 October 2025","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}},{"value":"\u00a9 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement","name":"copyright","label":"Copyright"}]}}