{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,8]],"date-time":"2026-09-08T17:09:16Z","timestamp":1788887356737,"version":"build-2803163510"},"reference-count":13,"publisher":"Optica Publishing Group","issue":"18","license":[{"start":{"date-parts":[[2026,9,8]],"date-time":"2026-09-08T00:00:00Z","timestamp":1788825600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/doi.org\/10.1364\/OA_License_v2#VOR"},{"start":{"date-parts":[[2026,9,8]],"date-time":"2026-09-08T00:00:00Z","timestamp":1788825600000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/opg.optica.org\/policies\/opg-tdm-policy.json"}],"funder":[{"name":"Leader Researcher\n\t\t\t\t\t\tProgram","award":["2019R1A3B2068083"],"award-info":[{"award-number":["2019R1A3B2068083"]}]}],"content-domain":{"domain":["opg.optica.org"],"crossmark-restriction":false},"short-container-title":["Opt. Lett."],"published-print":{"date-parts":[[2026,9,15]]},"abstract":"<jats:p>\n                    We propose a guided-mode-resonance (GMR) approach to evanescent-wave\n\t\t\t\t\tinterference lithography that overcomes the severe depth of field and\n\t\t\t\t\tproximity limitations of conventional near-field methods. The scheme\n\t\t\t\t\tconsists of a resonant dielectric grating and a photoresist layer\n\t\t\t\t\tseparated by a low-index buffer medium, where phase-matched evanescent\n\t\t\t\t\tcoupling transfers resonantly enhanced standing-wave fields from the\n\t\t\t\t\tgrating to the photoresist. Using rigorous coupled-wave analysis, we\n\t\t\t\t\tdesign a UV-compatible structure comprising HfO\n                    <jats:sub>2<\/jats:sub>\n                    grating\n\t\t\t\t\tridges, a commercial photoresist layer, and a transparent\n\t\t\t\t\timmersion-oil spacer. An example device supports two coupled GMR\n\t\t\t\t\tstates near 365\u2009nm that generate subwavelength interference\n\t\t\t\t\tfringes with a period of 120\u2009nm, corresponding to approximately\n\t\t\t\t\t\u03bb\/3. Enhanced field localization in the photoresist produces\n\t\t\t\t\tpeak intensities of ~600\u00d7 the incident intensity while\n\t\t\t\t\tmaintaining fringe visibility of ~0.999. The resonances remain\n\t\t\t\t\trobust for practical incidence-angle and grating\u2013photoresist\n\t\t\t\t\tspacing variations, including a 1-\u00b5m separation compatible with\n\t\t\t\t\tconventional lithographic processing. The large resonant enhancement\n\t\t\t\t\tcan reduce exposure times by nearly three orders of magnitude or\n\t\t\t\t\tequivalently lower required laser power. These results establish\n\t\t\t\t\tguided-mode-resonance field transfer as a potential route toward\n\t\t\t\t\thigh-resolution, low-power evanescent-wave interference lithography\n\t\t\t\t\tusing all-dielectric structures.\n                  <\/jats:p>","DOI":"10.1364\/ol.608815","type":"journal-article","created":{"date-parts":[[2026,8,16]],"date-time":"2026-08-16T18:00:11Z","timestamp":1786903211000},"page":"5101","update-policy":"https:\/\/doi.org\/10.1364\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Evanescent-wave interference lithography enabled by guided-mode-resonance field transfer"],"prefix":"10.1364","volume":"51","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-3362-6873","authenticated-orcid":true,"given":"Jae Woong","family":"Yoon","sequence":"first","affiliation":[{"name":"Hanyang University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-8584-0791","authenticated-orcid":true,"given":"Robert","family":"Magnusson","sequence":"additional","affiliation":[{"name":"University of Texas at Arlington"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"285","published-online":{"date-parts":[[2026,9,8]]},"reference":[{"key":"ol-51-18-5101-R1","doi-asserted-by":"publisher","first-page":"6710","DOI":"10.1364\/AO.49.006710","type":"journal-article","volume":"49","author":"Sreekanth","year":"2010","journal-title":"Appl. Opt."},{"key":"ol-51-18-5101-R2","doi-asserted-by":"publisher","first-page":"1521","DOI":"10.1166\/jnn.2014.9199","type":"journal-article","volume":"14","author":"Seo","year":"2014","journal-title":"J. Nanosci.\n\t\t\t\t\tNanotechnol."},{"key":"ol-51-18-5101-R3","doi-asserted-by":"publisher","first-page":"28849","DOI":"10.1364\/OE.23.028849","type":"journal-article","volume":"23","author":"Yoon","year":"2015","journal-title":"Opt. Express"},{"key":"ol-51-18-5101-R4","doi-asserted-by":"publisher","first-page":"142","DOI":"10.1088\/1464-4258\/5\/2\/311","type":"journal-article","volume":"5","author":"Sainov","year":"2003","journal-title":"J. Opt. A."},{"key":"ol-51-18-5101-R5","doi-asserted-by":"publisher","first-page":"2613","DOI":"10.1364\/OL.31.002613","type":"journal-article","volume":"31","author":"Guo","year":"2006","journal-title":"Opt. 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Am."},{"key":"ol-51-18-5101-R10","doi-asserted-by":"publisher","first-page":"383","DOI":"10.1016\/j.optmat.2004.04.014","type":"journal-article","volume":"27","author":"Al-Kuhaili","year":"2004","journal-title":"Opt. Mat."},{"key":"ol-51-18-5101-R11","doi-asserted-by":"publisher","first-page":"273","DOI":"10.1117\/12.240103","type":"journal-article","volume":"2725","author":"Norwood","year":"1996","journal-title":"Proc. SPIE"},{"key":"ol-51-18-5101-R13","doi-asserted-by":"publisher","first-page":"1077","DOI":"10.1364\/JOSAA.12.001077","type":"journal-article","volume":"12","author":"Moharam","year":"1995","journal-title":"J. Opt. Soc. Am.\n\t\t\t\t\tA"},{"key":"ol-51-18-5101-R14","doi-asserted-by":"publisher","first-page":"868310","DOI":"10.1117\/12.2008847","type":"journal-article","volume":"8683","author":"Heller","year":"2013","journal-title":"Proc. SPIE"}],"container-title":["Optics Letters"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/opg.optica.org\/viewmedia.cfm?URI=ol-51-18-5101&seq=0","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2026,9,8]],"date-time":"2026-09-08T16:48:36Z","timestamp":1788886116000},"score":1,"resource":{"primary":{"URL":"https:\/\/opg.optica.org\/abstract.cfm?URI=ol-51-18-5101"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2026,9,8]]},"references-count":13,"journal-issue":{"issue":"18","published-online":{"date-parts":[[2026]]},"published-print":{"date-parts":[[2026]]}},"URL":"https:\/\/doi.org\/10.1364\/ol.608815","relation":{},"ISSN":["0146-9592","1539-4794"],"issn-type":[{"value":"0146-9592","type":"print"},{"value":"1539-4794","type":"electronic"}],"subject":[],"published":{"date-parts":[[2026,9,8]]},"assertion":[{"value":"Optica Publishing Group","name":"publisher","label":"This article is maintained by"},{"value":"https:\/\/doi.org\/10.1364\/OL.608815","name":"articlelink","label":"Crossref DOI link to publisher maintained version"},{"value":"letter","name":"content_type","label":"Article type"},{"value":"Screened by Similarity Check","name":"cross_check","label":"Similarity check"},{"value":"Yes","order":0,"name":"peer_reviewed","label":"Peer reviewed","group":{"name":"peer_review","label":"Peer review"}},{"value":"Single blind","order":1,"name":"review_process","label":"Review process","group":{"name":"peer_review","label":"Peer review"}},{"value":"17 June 2026","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"11 August 2026","order":1,"name":"accepted","label":"Accepted","group":{"name":"publication_history","label":"Publication History"}},{"value":"8 September 2026","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}},{"value":"\u00a9 2026 Optica Publishing Group. All rights,\n\t\t\t\t\tincluding for text and data mining (TDM), Artificial Intelligence (AI)\n\t\t\t\t\ttraining, and similar technologies, are\n\t\t\t\t\treserved.","name":"copyright","label":"Copyright"}]}}