{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,1]],"date-time":"2025-11-01T02:46:29Z","timestamp":1761965189116},"reference-count":18,"publisher":"Walter de Gruyter GmbH","issue":"6","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2020,6,25]]},"abstract":"<jats:title>Abstract<\/jats:title>\n               <jats:p>Optical measuring and inspection systems play an important role in automation as they allow a comprehensive and non-contact quality assessment of products and processes. In this field, too, systems are increasingly being used that apply artificial intelligence and machine learning, mostly by means of artificial neural networks. Results achieved with this approach are often very promising and require less development effort. However, the supplementation and replacement of classical image processing methods by machine learning methods is not unproblematic, especially in applications with high safety or quality requirements, since the latter have characteristics that differ considerably from classical image processing methods. In this paper, essential aspects and trends of machine learning and artificial intelligence for the application in optical measurement and inspection systems are presented and discussed.<\/jats:p>","DOI":"10.1515\/auto-2020-0006","type":"journal-article","created":{"date-parts":[[2020,6,2]],"date-time":"2020-06-02T08:48:38Z","timestamp":1591087718000},"page":"477-487","source":"Crossref","is-referenced-by-count":4,"title":["Artificial intelligence with neural networks in optical measurement and inspection systems"],"prefix":"10.1515","volume":"68","author":[{"given":"Michael","family":"Heizmann","sequence":"first","affiliation":[{"name":"Karlsruhe Institute of Technology (KIT) , Karlsruhe , Germany"}]},{"given":"Alexander","family":"Braun","sequence":"additional","affiliation":[{"name":"University of Applied Sciences D\u00fcsseldorf , D\u00fcsseldorf , Germany"}]},{"given":"Markus","family":"H\u00fcttel","sequence":"additional","affiliation":[{"name":"Fraunhofer IPA , Stuttgart , Germany"}]},{"given":"Christina","family":"Kl\u00fcver","sequence":"additional","affiliation":[{"name":"University of Duisburg-Essen , Essen , Germany"}]},{"given":"Erik","family":"Marquardt","sequence":"additional","affiliation":[{"name":"VDI e.\u2009V. , D\u00fcsseldorf , Germany"}]},{"given":"Michael","family":"Overdick","sequence":"additional","affiliation":[{"name":"SICK AG , Waldkirch , Germany"}]},{"given":"Markus","family":"Ulrich","sequence":"additional","affiliation":[{"name":"Karlsruhe Institute of Technology (KIT) , Karlsruhe , Germany"}]}],"member":"374","published-online":{"date-parts":[[2020,6,2]]},"reference":[{"key":"2023033110051065702_j_auto-2020-0006_ref_001_w2aab3b7c43b1b6b1ab2b1b1Aa","unstructured":"Series of Standards VDI\/VDE 5575 X-ray optical systems. 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