{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,6,29]],"date-time":"2026-06-29T03:16:34Z","timestamp":1782702994873,"version":"3.54.5"},"reference-count":16,"publisher":"Oxford University Press (OUP)","issue":"2","license":[{"start":{"date-parts":[[2013,6,28]],"date-time":"2013-06-28T00:00:00Z","timestamp":1372377600000},"content-version":"vor","delay-in-days":119,"URL":"http:\/\/onlinelibrary.wiley.com\/termsAndConditions#vor"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Journal of Occupational Health"],"published-print":{"date-parts":[[2013,3]]},"abstract":"<jats:sec><jats:label\/><jats:p><jats:bold>Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration: Seung\u2010Hyun PARK, <jats:italic>et al<\/jats:italic>. Occupational Safety and Health Research Institute, Korea Occupational Safety and Health Agency, Republic of Korea\u2014<\/jats:bold><\/jats:p><\/jats:sec><jats:sec><jats:title>Objectives<\/jats:title><jats:p>The purpose of this study was to examine the cause of an accidental death from acute poisoning resulting from exposure to a cleaner containing tetramethylammonium hydroxide (TMAH) and to consider measures to prevent future cases.<\/jats:p><\/jats:sec><jats:sec><jats:title>Methods<\/jats:title><jats:p>The authors examined the details and the reason for the accidental death from acute poisoning based on the autopsy report.<\/jats:p><\/jats:sec><jats:sec><jats:title>Results<\/jats:title><jats:p>The victim was a 39\u2010year\u2010old male researcher with 7 years of work experience employed by a surfactant production company. The accident occurred when he was conducting a field test of a newly developed cleaner, containing 8.75% TMAH solution. The researcher spilled the cleaner on his work clothes in the area of both the hands\/arms and legs. He was unconscious when discovered. An autopsy found no damage or injury that could have resulted in death other than burns to 12% of his body, and the cause of death was found to be acute poisoning by TMAH.<\/jats:p><\/jats:sec><jats:sec><jats:title>Discussion<\/jats:title><jats:p>TMAH is widely used in the electronics industry as a developer or cleaner. It is a dangerous material, causing neurotoxicity leading to respiratory failure by ganglion block that occurs through skin absorption, and no antidote has been developed yet. For this reason, it is best to completely prevent exposure by wearing proper personal protective equipment. Despite this fatal toxicity of TMAH, it is not classified in Korea as a \u201cchemical requiring legal control\u201d. For this reason, it is urgent to raise awareness of the toxic properties of TMAH to prevent additional cases of TMAH poisoning.<\/jats:p><\/jats:sec>","DOI":"10.1539\/joh.12-0143-cs","type":"journal-article","created":{"date-parts":[[2013,1,18]],"date-time":"2013-01-18T02:04:12Z","timestamp":1358474652000},"page":"120-124","source":"Crossref","is-referenced-by-count":26,"title":["Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration"],"prefix":"10.1093","volume":"55","author":[{"given":"Seung\u2010Hyun","family":"Park","sequence":"first","affiliation":[{"name":"Occupational Safety and Health Research Institute, Korea Occupational Safety and Health Agency Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jungsun","family":"Park","sequence":"additional","affiliation":[{"name":"Occupational Safety and Health Research Institute, Korea Occupational Safety and Health Agency Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ki\u2010Ho","family":"You","sequence":"additional","affiliation":[{"name":"Occupational Safety and Health Research Institute, Korea Occupational Safety and Health Agency Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Hae\u2010Chul","family":"Shin","sequence":"additional","affiliation":[{"name":"Gyeonggi Nambu Area office, Korea Occupational Safety and Health Agency Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Hyun\u2010Ock","family":"Kim","sequence":"additional","affiliation":[{"name":"Department of Occupational Health Korea Occupational Safety and Health Agency Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"286","published-online":{"date-parts":[[2013,6,28]]},"reference":[{"key":"e_1_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.3109\/15563651003627777"},{"key":"e_1_2_1_3_1","unstructured":"TanakaA SakamotoK YonedaY YokouchiK inventors; Nippon Zeon Co. Ltd. Fujitsu limited assignees.Developer for photosensitive polyimide resin composition. United States Patent US 6403289 B1.2002Jun 11."},{"key":"e_1_2_1_4_1","unstructured":"KanadaT HanahataH JinX WajiS inventors; Asahi Kasei EMD corporation PI R&D Co. Ltd. assignees.Positive photosensitive resin composition. United States Patent US 20090267239 A1.2009Oct 29."},{"key":"e_1_2_1_5_1","unstructured":"GeistJ inventor; Optical ETC Inc. assignee.Method for TMAH etching of CMOS integrated circuits. United States Patent US 7094696 B2.2006Aug 22."},{"key":"e_1_2_1_6_1","unstructured":"AndreasM MorganPA inventors; Micron Technology Inc. assignee.Wafer cleaning method and resulting wafer. United States Patent US 6930017 B2.2005Aug 16."},{"key":"e_1_2_1_7_1","unstructured":"UemuraY inventor; Fujimi Incorporated assignee.Polishing composition and polishing method. 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