{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2022,4,3]],"date-time":"2022-04-03T21:03:28Z","timestamp":1649019808360},"reference-count":17,"publisher":"Springer Science and Business Media LLC","license":[{"start":{"date-parts":[[1993,1,1]],"date-time":"1993-01-01T00:00:00Z","timestamp":725846400000},"content-version":"unspecified","delay-in-days":0,"URL":"https:\/\/www.cambridge.org\/core\/terms"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["MRS Proc."],"abstract":"<jats:p>Hydrogenated amorphous silicon, <jats:italic>a-Si:H<\/jats:italic>, is deposited from silane (<jats:italic>SiH<jats:sub>4<\/jats:sub><\/jats:italic>) and hydrogen (<jats:italic>H<jats:sub>2<\/jats:sub><\/jats:italic>) using a tungsten wire at low filament temperatures (<jats:italic>T<jats:sub>fil<\/jats:sub><\/jats:italic> = 1200<jats:italic>\u00b0C<\/jats:italic>) by catalytic chemical vapor deposition.<\/jats:p><jats:p>The deposition rate increases monotonically with the depositions pressures and shows a maximum at an <jats:italic>H<jats:sub>2<\/jats:sub><\/jats:italic> : <jats:italic>SiH<jats:sub>4<\/jats:sub><\/jats:italic> flow ratio of unity. Vanishingly small deposition rates were observed for silane-only depositions and for <jats:italic>H<jats:sub>2<\/jats:sub><\/jats:italic>-to-<jats:italic>SiH<jats:sub>4<\/jats:sub><\/jats:italic> flow ratios of 2.5 and above. The optoelectronic properties show complex dependence on substrate temperature (<jats:italic>T<jats:sub>sub<\/jats:sub><\/jats:italic>). Three intervals of <jats:italic>T<jats:sub>sub<\/jats:sub><\/jats:italic> with distinct optoelectronic were observed: as <jats:italic>T<jats:sub>sub<\/jats:sub><\/jats:italic> increases from 180 to 220<jats:italic>\u00b0C<\/jats:italic>, the optical bandgap, <jats:italic>E<jats:sub>g<\/jats:sub><jats:sup>Tauc<\/jats:sup><\/jats:italic> increases from 1.9 to 2.4<jats:italic>eV,<\/jats:italic> the dark conductivity,\u03c3<jats:sub>d<\/jats:sub>, decreases from 10<jats:sup>-10<\/jats:sup> to 10<jats:sup>-15<\/jats:sup> \u03a9<jats:sup>-1<\/jats:sup><jats:italic>cm<\/jats:italic><jats:sup>-1<\/jats:sup>and the photoconductivity, <jats:italic>\u03c3<jats:sub>ph<\/jats:sub><\/jats:italic>, decreases from 10<jats:sup>-5<\/jats:sup> to 10<jats:sup>-10<\/jats:sup>\u03a9<jats:sup>-1<\/jats:sup><jats:italic>cm<\/jats:italic><jats:sup>-1<\/jats:sup> (region (i)). As <jats:italic>T<jats:sub>sub<\/jats:sub><\/jats:italic> increases from 220 to 250 <jats:italic>\u00b0C<\/jats:italic>, <jats:italic>E<jats:sub>g<\/jats:sub><jats:sup>Tauc<\/jats:sup><\/jats:italic> decreases to 1.8<jats:italic>eV<\/jats:italic> and the photosensitivity, <jats:italic>\u03c3<jats:sub>ph<\/jats:sub>\/\u03c3<jats:sub>d<\/jats:sub><\/jats:italic> decreases to ~ 1 due to an increase of both <jats:italic>\u03c3<jats:sub>d<\/jats:sub><\/jats:italic> and <jats:italic>\u03c3<jats:sub>ph<\/jats:sub><\/jats:italic> (region (ii)). Throughout these two regions, the photoconductivity \u03b3 factor remains between 0.6 and 0.9 and the activation energy of the dark conductivity, <jats:italic>E<jats:sub>a,\u03c3d<\/jats:sub><\/jats:italic>, remains between 0.7 and 0.9<jats:italic>eV<\/jats:italic>. Above 250<jats:italic>\u00b0C,<\/jats:italic> the <jats:italic>\u03c3<jats:sub>ph<\/jats:sub><\/jats:italic> and <jats:italic>\u03c3<jats:sub>d<\/jats:sub><\/jats:italic> remain approximately constant at 10<jats:sup>-4<\/jats:sup> \u03a9<jats:sup>-1<\/jats:sup><jats:italic>cm<\/jats:italic><jats:sup>-1<\/jats:sup> and \u03b3 decreases to below 0.5 and <jats:italic>E<jats:sub>a,\u03c3d<\/jats:sub><\/jats:italic> ~ 0.3<jats:italic>eV.<\/jats:italic><\/jats:p>","DOI":"10.1557\/proc-297-121","type":"journal-article","created":{"date-parts":[[2011,3,6]],"date-time":"2011-03-06T09:36:08Z","timestamp":1299404168000},"source":"Crossref","is-referenced-by-count":1,"title":["Low Filament Temperature Deposition of a-Si:H by Catalytic Chemical Vapor Deposition"],"prefix":"10.1557","volume":"297","author":[{"given":"P.","family":"Brogueira","sequence":"first","affiliation":[]},{"given":"S.","family":"Grebner","sequence":"additional","affiliation":[]},{"given":"F.","family":"Wang","sequence":"additional","affiliation":[]},{"given":"R.","family":"schwarz","sequence":"additional","affiliation":[]},{"given":"V.","family":"Chu","sequence":"additional","affiliation":[]},{"given":"J.P.","family":"Conde","sequence":"additional","affiliation":[]}],"member":"297","published-online":{"date-parts":[[1993,1,1]]},"reference":[{"key":"S194642740052524X_ref004","doi-asserted-by":"publisher","DOI":"10.1063\/1.341539"},{"key":"S194642740052524X_ref013","doi-asserted-by":"publisher","DOI":"10.1016\/0165-1633(83)90006-0"},{"key":"S194642740052524X_ref011","doi-asserted-by":"publisher","DOI":"10.1143\/JJAP.30.L1522"},{"key":"S194642740052524X_ref016","doi-asserted-by":"publisher","DOI":"10.1017\/CBO9780511525247"},{"key":"S194642740052524X_ref009","doi-asserted-by":"publisher","DOI":"10.1063\/1.342069"},{"key":"S194642740052524X_ref005","doi-asserted-by":"publisher","DOI":"10.1063\/1.348897"},{"key":"S194642740052524X_ref015","unstructured":"15. Wang N. and Wagner S. , private communication."},{"key":"S194642740052524X_ref001","doi-asserted-by":"publisher","DOI":"10.1063\/1.326284"},{"key":"S194642740052524X_ref012","doi-asserted-by":"publisher","DOI":"10.1364\/AO.17.002779"},{"key":"S194642740052524X_ref002","doi-asserted-by":"publisher","DOI":"10.1143\/JJAP.25.L949"},{"key":"S194642740052524X_ref006","doi-asserted-by":"publisher","DOI":"10.1063\/1.103117"},{"key":"S194642740052524X_ref008","doi-asserted-by":"publisher","DOI":"10.1063\/1.98871"},{"key":"S194642740052524X_ref010","doi-asserted-by":"publisher","DOI":"10.1063\/1.107557"},{"key":"S194642740052524X_ref014","doi-asserted-by":"publisher","DOI":"10.1016\/S0022-3093(05)80127-9"},{"key":"S194642740052524X_ref017","doi-asserted-by":"publisher","DOI":"10.1063\/1.347106"},{"key":"S194642740052524X_ref003","doi-asserted-by":"publisher","DOI":"10.1063\/1.343278"},{"key":"S194642740052524X_ref007","doi-asserted-by":"publisher","DOI":"10.1063\/1.351539"}],"container-title":["MRS Proceedings"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/www.cambridge.org\/core\/services\/aop-cambridge-core\/content\/view\/S194642740052524X","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2021,2,24]],"date-time":"2021-02-24T21:05:43Z","timestamp":1614200743000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1557\/PROC-297-121"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1993,1,1]]},"references-count":17,"alternative-id":["S194642740052524X"],"URL":"https:\/\/doi.org\/10.1557\/proc-297-121","relation":{},"ISSN":["0272-9172","1946-4274"],"issn-type":[{"value":"0272-9172","type":"print"},{"value":"1946-4274","type":"electronic"}],"subject":[],"published":{"date-parts":[[1993,1,1]]},"article-number":"121"}}