{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,15]],"date-time":"2026-10-15T16:19:35Z","timestamp":1792081175965,"version":"4.4.0"},"reference-count":125,"publisher":"Emerald","issue":"4","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2007,8,8]]},"abstract":"<jats:p>As IC technologies scale to finer feature sizes, it becomes increasingly difficult to control the relative process variations. The increasing fluctuations in manufacturing processes have introduced unavoidable and significant uncertainty in circuit performance; hence ensuring manufacturability has been identified as one of the top priorities of today\u2019s IC design problems. In this paper, we review various statistical methodologies that have been recently developed to model, analyze, and optimize performance variations at both transistor level and system level. The following topics will be discussed in detail: sources of process variations, variation characterization and modeling, Monte Carlo analysis, response surface modeling, statistical timing and leakage analysis, probability distribution extraction, parametric yield estimation and robust IC optimization. These techniques provide the necessary CAD infrastructure that facilitates the bold move from deterministic, corner-based IC design toward statistical and probabilistic design.<\/jats:p>","DOI":"10.1561\/1000000008","type":"journal-article","created":{"date-parts":[[2007,8,20]],"date-time":"2007-08-20T09:04:39Z","timestamp":1187600679000},"page":"331-480","source":"Crossref","is-referenced-by-count":26,"title":["Statistical Performance Modeling and Optimization"],"prefix":"10.1108","volume":"1","author":[{"given":"Xin","family":"Li","sequence":"first","affiliation":[{"name":"Carnegie Mellon University Department of ECE, , , ,","place":["Pittsburgh, PA, USA, 15213"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jiayong","family":"Le","sequence":"additional","affiliation":[{"name":"Extreme DA , 165 University Avenue, ,","place":["Palo Alto, CA, USA, 94301"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Lawrence T","family":"Pileggi","sequence":"additional","affiliation":[{"name":"Carnegie Mellon University Department of ECE, , ,","place":["Pittsburgh, PA, USA, 15213"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"140","published-online":{"date-parts":[[2007,8,8]]},"reference":[{"issue":"8","key":"2026032901220370400_ref001","doi-asserted-by":"crossref","first-page":"1006","DOI":"10.1109\/43.85738","article-title":"The ellipsoidal technique for design centering and region approximation","volume":"10","author":"Abdel-Malek","year":"1991","journal-title":"IEEE Trans. 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