{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,9,22]],"date-time":"2025-09-22T22:40:03Z","timestamp":1758580803553,"version":"3.44.0"},"reference-count":22,"publisher":"Laser Institute of AmericaLIA","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2001,10,1]]},"abstract":"<jats:p>A study was performed on dry and steam cleaning of single-crystal silicon wafers contaminated with Au, Cu and W particles, using KrF laser radiation. Samples were processed at 0.3 J\/cm2. In dry cleaning, the cleaning efficiency after 100 pulses varies between 60 and 90 %, depending on the contaminating material. In steam cleaning, the efficiency is 100 % after 5 laser pulses, independently of the type of contaminant. The high efficiency of steam cleaning is explained by the high ejection force resulting from explosive evaporation of the water film present at the surface. Laser cleaning at this fluence does not deteriorate the substrate, but slight metallic contamination was detected by XPS on laser cleaned surfaces. Quantification of XPS results made assuming a stratified overlayer model showed that the results can be explained by the formation of a fractional metallic monolayer, due to partial vaporization of the particles initially present on the surface and recondensation. This contamination of the substrate could be considered excessive for some applications, showing that the process requires careful optimization for the required efficiency to be achieved while avoiding contamination.<\/jats:p>","DOI":"10.2351\/1.5059848","type":"proceedings-article","created":{"date-parts":[[2018,10,17]],"date-time":"2018-10-17T13:35:35Z","timestamp":1539783335000},"page":"1744-1753","update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":0,"title":["Excimer laser-assisted cleaning of single-crystal silicon wafers contaminated with metallic particles"],"prefix":"10.2351","author":[{"given":"P.","family":"Neves","sequence":"additional","affiliation":[{"name":"Department of Materials Engineering, Instituto Superior Tecnico 1 Lisbon,","place":["Portugal"]}]},{"given":"M.","family":"Arronte","sequence":"additional","affiliation":[{"name":"Department of Materials Engineering, Instituto Superior Tecnico 1 Lisbon,","place":["Portugal"]}]},{"given":"A.","family":"Almeida","sequence":"additional","affiliation":[{"name":"Department of Materials Engineering, Instituto Superior Tecnico 1 Lisbon,","place":["Portugal"]}]},{"given":"R.","family":"Vilar","sequence":"additional","affiliation":[{"name":"Department of Materials Engineering, Instituto Superior Tecnico 1 Lisbon,","place":["Portugal"]}]},{"given":"A. 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