{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,23]],"date-time":"2026-03-23T23:28:48Z","timestamp":1774308528751,"version":"3.50.1"},"reference-count":2,"publisher":"IEEE","license":[{"start":{"date-parts":[[2021,6,13]],"date-time":"2021-06-13T00:00:00Z","timestamp":1623542400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2021,6,13]],"date-time":"2021-06-13T00:00:00Z","timestamp":1623542400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2021,6,13]]},"DOI":"10.23919\/vlsicircuits52068.2021.9492339","type":"proceedings-article","created":{"date-parts":[[2021,7,28]],"date-time":"2021-07-28T16:33:42Z","timestamp":1627490022000},"page":"1-2","source":"Crossref","is-referenced-by-count":6,"title":["Development of Advanced Inter-Color-Filter Grid on Sub-Micron-Pixel CMOS Image Sensor for Mobile Cameras with High Sensitivity and High Resolution"],"prefix":"10.23919","author":[{"given":"In-Sung","family":"Joe","sequence":"first","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Yunki","family":"Lee","sequence":"additional","affiliation":[{"name":"Samsung Electronics, System LSI Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"Hye Yeon","family":"Park","sequence":"additional","affiliation":[{"name":"Samsung Electronics, System LSI Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"Jong","family":"Uk Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Dongyeon","family":"Kang","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Taehoon","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Minkwan","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Kwangmin","family":"Lee","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Minsung","family":"Heo","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Inho","family":"Ro","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Jinhyung","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Inyong","family":"Park","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Seokjin","family":"Kwon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Kisang","family":"Yoon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Dami","family":"Park","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Changkyu","family":"Lee","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Eunyoung","family":"Jo","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Minhwan","family":"Jeon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Chanho","family":"Park","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Kyung Rae","family":"Byun","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Chong","family":"Kwang Chang","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"JaeSung","family":"Hur","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Kijoong","family":"Yoon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Taeksoo","family":"Jeon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Jaehak","family":"Lee","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Foundry Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"Jungho","family":"Park","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Foundry Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"Bumsuk","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, System LSI Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"JungChak","family":"Ahn","sequence":"additional","affiliation":[{"name":"Samsung Electronics, System LSI Business,Yonginsi,Gyeonggido,Korea"}]},{"given":"Hyunchul","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Chang-Rok","family":"Moon","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]},{"given":"Hyoung-Sub","family":"Kim","sequence":"additional","affiliation":[{"name":"Samsung Electronics, Semiconductor R&D Center,Hwaseongsi,Gyeonggido,Korea"}]}],"member":"263","reference":[{"key":"ref2","first-page":"12","article-title":"World first mass productive 0.8 ?m pixel size image sensor with new optical isolation technology to minimize optical loss for high sensitivity","author":"lee","year":"2019","journal-title":"IISW"},{"key":"ref1","first-page":"104","article-title":"A 1\/2.65in 44Mpixel CMOS image sensor with 0.7?m pixels fabricated in advanced full-depth deep-trench isolation technology","author":"kim","year":"2020","journal-title":"ISSCC"}],"event":{"name":"2021 Symposium on VLSI Circuits","location":"Kyoto, Japan","start":{"date-parts":[[2021,6,13]]},"end":{"date-parts":[[2021,6,19]]}},"container-title":["2021 Symposium on VLSI Circuits"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/9492225\/9492226\/09492339.pdf?arnumber=9492339","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,8,26]],"date-time":"2025-08-26T19:11:37Z","timestamp":1756235497000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/9492339\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2021,6,13]]},"references-count":2,"URL":"https:\/\/doi.org\/10.23919\/vlsicircuits52068.2021.9492339","relation":{},"subject":[],"published":{"date-parts":[[2021,6,13]]}}}