{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,4,24]],"date-time":"2026-04-24T14:58:24Z","timestamp":1777042704524,"version":"3.51.4"},"reference-count":7,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,6,11]]},"DOI":"10.23919\/vlsitechnologyandcir57934.2023.10185218","type":"proceedings-article","created":{"date-parts":[[2023,7,24]],"date-time":"2023-07-24T17:36:33Z","timestamp":1690220193000},"page":"1-2","source":"Crossref","is-referenced-by-count":53,"title":["Nanosheet-based Complementary Field-Effect Transistors (CFETs) at 48nm Gate Pitch, and Middle Dielectric Isolation to enable CFET Inner Spacer Formation and Multi-Vt Patterning"],"prefix":"10.23919","author":[{"given":"H.","family":"Mertens","sequence":"first","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"M.","family":"Hosseini","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"T.","family":"Chiarella","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"D.","family":"Zhou","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Wang","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"G.","family":"Mannaert","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"E.","family":"Dupuy","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"D.","family":"Radisic","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"Z.","family":"Tao","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"Y.","family":"Oniki","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"A.","family":"Hikavyy","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"R.","family":"Rosseel","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"A.","family":"Mingardi","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Choudhury","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"P. Puttarame","family":"Gowda","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"F.","family":"Sebaai","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"A.","family":"Peter","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"K.","family":"Vandersmissen","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"J.P.","family":"Soulie","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"A. De","family":"Keersgieter","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"L. Petersen Barbosa","family":"Lima","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"C.","family":"Cavalcante","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"D.","family":"Batuk","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"G.T.","family":"Martinez","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"J.","family":"Geypen","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"F.","family":"Seidel","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"K.","family":"Paulussen","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"P.","family":"Favia","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"J.","family":"Boemmels","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"R.","family":"Loo","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"P.","family":"Wong","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"A. Sepulveda","family":"Marquez","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"B.T.","family":"Chan","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"J.","family":"Mitard","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Subramanian","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Demuynck","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"E. Dentoni","family":"Litta","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"N.","family":"Horiguchi","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Samavedam","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]},{"given":"S.","family":"Biesemans","sequence":"additional","affiliation":[{"name":"Imec,Leuven,Belgium"}]}],"member":"263","reference":[{"key":"ref7","first-page":"623","author":"chang","year":"2022","journal-title":"IEDM"},{"key":"ref4","first-page":"425","author":"huang","year":"2020","journal-title":"IEDM"},{"key":"ref3","first-page":"254","author":"chang","year":"2019","journal-title":"IEDM"},{"key":"ref6","first-page":"721","author":"radosavljevi?","year":"2021","journal-title":"IEDM"},{"key":"ref5","first-page":"1","author":"subramanian","year":"2020","journal-title":"VLSI"},{"key":"ref2","doi-asserted-by":"crossref","first-page":"1998","DOI":"10.1109\/TED.2005.854267","volume":"52","author":"wu","year":"2005","journal-title":"IEEE TED"},{"key":"ref1","first-page":"141","author":"ryckaert","year":"2018","journal-title":"VLSI"}],"event":{"name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","location":"Kyoto, Japan","start":{"date-parts":[[2023,6,11]]},"end":{"date-parts":[[2023,6,16]]}},"container-title":["2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10185199\/10185158\/10185218.pdf?arnumber=10185218","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,12,11]],"date-time":"2023-12-11T19:02:10Z","timestamp":1702321330000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10185218\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,6,11]]},"references-count":7,"URL":"https:\/\/doi.org\/10.23919\/vlsitechnologyandcir57934.2023.10185218","relation":{},"subject":[],"published":{"date-parts":[[2023,6,11]]}}}