{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,23]],"date-time":"2026-01-23T08:14:32Z","timestamp":1769156072057,"version":"3.49.0"},"reference-count":4,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,6,11]]},"DOI":"10.23919\/vlsitechnologyandcir57934.2023.10185229","type":"proceedings-article","created":{"date-parts":[[2023,7,24]],"date-time":"2023-07-24T17:36:33Z","timestamp":1690220193000},"page":"1-2","source":"Crossref","is-referenced-by-count":1,"title":["Doping-Optimized Back-illuminated Single-Photon Avalanche Diode in Stacked 40 nm CIS Technology Achieving 60% PDP at 905 nm"],"prefix":"10.23919","author":[{"given":"Eunsung","family":"Park","sequence":"first","affiliation":[{"name":"Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Won-Yong","family":"Ha","sequence":"additional","affiliation":[{"name":"Institute of Electrical and Micro Engineering, &#x00C9;cole Polytechnique F&#x00E9;d&#x00E9;rale de Lausanne, Rue de la Maladi&#x00E8;re 71B,Neuchatel,NE,Switzerland,2000"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Doyoon","family":"Eom","sequence":"additional","affiliation":[{"name":"Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Dae-Hwan","family":"Ahn","sequence":"additional","affiliation":[{"name":"Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hyuk","family":"An","sequence":"additional","affiliation":[{"name":"CIS Division,SK hynix,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Suhyun","family":"Yi","sequence":"additional","affiliation":[{"name":"CIS Division,SK hynix,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kyung-Do","family":"Kim","sequence":"additional","affiliation":[{"name":"CIS Division,SK hynix,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jongchae","family":"Kim","sequence":"additional","affiliation":[{"name":"CIS Division,SK hynix,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Woo-Young","family":"Choi","sequence":"additional","affiliation":[{"name":"Yonsei University,Department of Electrical and Electronic Engineering,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Myung-Jae","family":"Lee","sequence":"additional","affiliation":[{"name":"Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref4","author":"shimada","year":"2021","journal-title":"IEDM"},{"key":"ref3","author":"morimoto","year":"2021","journal-title":"IEDM"},{"key":"ref2","author":"lee","year":"2017","journal-title":"IEDM"},{"key":"ref1","author":"al abbas","year":"2016","journal-title":"IEDM"}],"event":{"name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","location":"Kyoto, Japan","start":{"date-parts":[[2023,6,11]]},"end":{"date-parts":[[2023,6,16]]}},"container-title":["2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10185199\/10185158\/10185229.pdf?arnumber=10185229","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,8,28]],"date-time":"2023-08-28T17:40:11Z","timestamp":1693244411000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10185229\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,6,11]]},"references-count":4,"URL":"https:\/\/doi.org\/10.23919\/vlsitechnologyandcir57934.2023.10185229","relation":{},"subject":[],"published":{"date-parts":[[2023,6,11]]}}}