{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,31]],"date-time":"2026-03-31T13:45:44Z","timestamp":1774964744210,"version":"3.50.1"},"reference-count":6,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,6,11]]},"DOI":"10.23919\/vlsitechnologyandcir57934.2023.10185282","type":"proceedings-article","created":{"date-parts":[[2023,7,24]],"date-time":"2023-07-24T17:36:33Z","timestamp":1690220193000},"page":"1-2","source":"Crossref","is-referenced-by-count":4,"title":["Characterizing and Reducing the Layout Dependent Effect and Gate Resistance to Enable Multiple-Vt Scaling for a 3nm CMOS Technology"],"prefix":"10.23919","author":[{"given":"C.A.","family":"Lu","sequence":"first","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.P.","family":"Lee","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.C.","family":"Chen","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Y.C.","family":"Lin","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Y.H.","family":"Chung","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"S.H.","family":"Wang","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"J.Y.","family":"Yeh","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"V.S.","family":"Chang","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"M.C.","family":"Chiang","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"W.","family":"Chang","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.C.","family":"Chung","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"C.F.","family":"Cheng","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.H.","family":"Hsu","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.H.","family":"Liu","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"William P.N.","family":"Chen","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"C.Y.","family":"Lin","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company,Hsinchu,R.O.C,Taiwan"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref1","first-page":"27.5.1","author":"Wu","year":"2022","journal-title":"IEDM"},{"key":"ref2","first-page":"27.1.1","author":"Chang","year":"2022","journal-title":"IEDM"},{"key":"ref3","author":"Chang","year":"2020","journal-title":"VLSI Tech., TC1.1_687"},{"key":"ref4","first-page":"25.6.2","article-title":"IEDM","author":"Hamaguchi","year":"2011"},{"issue":"9","key":"ref5","doi-asserted-by":"crossref","first-page":"1101","DOI":"10.1109\/LED.2013.2274511","volume":"34","author":"Lu","year":"2013","journal-title":"EDL"},{"issue":"4","key":"ref6","first-page":"469","volume":"19","author":"Veendrick","year":"1984","journal-title":"JSSC"}],"event":{"name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","location":"Kyoto, Japan","start":{"date-parts":[[2023,6,11]]},"end":{"date-parts":[[2023,6,16]]}},"container-title":["2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10185199\/10185158\/10185282.pdf?arnumber=10185282","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,3,1]],"date-time":"2024-03-01T14:41:48Z","timestamp":1709304108000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10185282\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,6,11]]},"references-count":6,"URL":"https:\/\/doi.org\/10.23919\/vlsitechnologyandcir57934.2023.10185282","relation":{},"subject":[],"published":{"date-parts":[[2023,6,11]]}}}