{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,6,2]],"date-time":"2026-06-02T23:45:30Z","timestamp":1780443930232,"version":"3.54.1"},"reference-count":7,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,6,11]],"date-time":"2023-06-11T00:00:00Z","timestamp":1686441600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,6,11]]},"DOI":"10.23919\/vlsitechnologyandcir57934.2023.10185415","type":"proceedings-article","created":{"date-parts":[[2023,7,24]],"date-time":"2023-07-24T17:36:33Z","timestamp":1690220193000},"page":"1-2","source":"Crossref","is-referenced-by-count":16,"title":["An 18.8-to-23.3 GHz ADPLL Based on Charge-Steering-Sampling Technique Achieving 75.9 fs RMS Jitter and \u2013252 dB FoM"],"prefix":"10.23919","author":[{"given":"Weichen","family":"Tao","sequence":"first","affiliation":[{"name":"University of Science and Technology of China,Hefei,China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Weichen","family":"Zhao","sequence":"additional","affiliation":[{"name":"University of Science and Technology of China,Hefei,China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Robert Bogdan","family":"Staszewski","sequence":"additional","affiliation":[{"name":"University College Dublin,Dublin,Ireland"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Fujiang","family":"Lin","sequence":"additional","affiliation":[{"name":"University of Science and Technology of China,Hefei,China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yizhe","family":"Hu","sequence":"additional","affiliation":[{"name":"University of Science and Technology of China,Hefei,China"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref7","volume":"52","author":"murphy","year":"2017","journal-title":"IEEE JSSC"},{"key":"ref4","volume":"56","author":"wu","year":"2021","journal-title":"IEEE JSSC"},{"key":"ref3","first-page":"1","author":"du","year":"2022","journal-title":"VLSI"},{"key":"ref6","volume":"57","author":"hu","year":"2022","journal-title":"IEEEJSSC"},{"key":"ref5","volume":"57","author":"dartizio","year":"2022","journal-title":"IEEE JSSC"},{"key":"ref2","volume":"57","author":"gong","year":"2022","journal-title":"IEEE JSSC"},{"key":"ref1","first-page":"10","author":"yang","year":"2022","journal-title":"VLSI"}],"event":{"name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","location":"Kyoto, Japan","start":{"date-parts":[[2023,6,11]]},"end":{"date-parts":[[2023,6,16]]}},"container-title":["2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10185199\/10185158\/10185415.pdf?arnumber=10185415","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,12,11]],"date-time":"2023-12-11T19:02:22Z","timestamp":1702321342000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10185415\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,6,11]]},"references-count":7,"URL":"https:\/\/doi.org\/10.23919\/vlsitechnologyandcir57934.2023.10185415","relation":{},"subject":[],"published":{"date-parts":[[2023,6,11]]}}}