{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,22]],"date-time":"2026-01-22T18:27:30Z","timestamp":1769106450618,"version":"3.49.0"},"reference-count":53,"publisher":"MDPI AG","issue":"6","license":[{"start":{"date-parts":[[2024,11,4]],"date-time":"2024-11-04T00:00:00Z","timestamp":1730678400000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"funder":[{"name":"K-CHIPS (Korea Collaborative &amp; High-tech Initiative for Prospective Semiconductor Research)","award":["KEIT1415187508"],"award-info":[{"award-number":["KEIT1415187508"]}]},{"name":"K-CHIPS (Korea Collaborative &amp; High-tech Initiative for Prospective Semiconductor Research)","award":["20024772"],"award-info":[{"award-number":["20024772"]}]},{"name":"K-CHIPS (Korea Collaborative &amp; High-tech Initiative for Prospective Semiconductor Research)","award":["NK248E"],"award-info":[{"award-number":["NK248E"]}]},{"name":"K-CHIPS (Korea Collaborative &amp; High-tech Initiative for Prospective Semiconductor Research)","award":["NK251E"],"award-info":[{"award-number":["NK251E"]}]},{"name":"K-CHIPS (Korea Collaborative &amp; High-tech Initiative for Prospective Semiconductor Research)","award":["2020M3H4A3081879"],"award-info":[{"award-number":["2020M3H4A3081879"]}]},{"name":"KIMM institutional program","award":["KEIT1415187508"],"award-info":[{"award-number":["KEIT1415187508"]}]},{"name":"KIMM institutional program","award":["20024772"],"award-info":[{"award-number":["20024772"]}]},{"name":"KIMM institutional program","award":["NK248E"],"award-info":[{"award-number":["NK248E"]}]},{"name":"KIMM institutional program","award":["NK251E"],"award-info":[{"award-number":["NK251E"]}]},{"name":"KIMM institutional program","award":["2020M3H4A3081879"],"award-info":[{"award-number":["2020M3H4A3081879"]}]},{"name":"NST\/KIMM","award":["KEIT1415187508"],"award-info":[{"award-number":["KEIT1415187508"]}]},{"name":"NST\/KIMM","award":["20024772"],"award-info":[{"award-number":["20024772"]}]},{"name":"NST\/KIMM","award":["NK248E"],"award-info":[{"award-number":["NK248E"]}]},{"name":"NST\/KIMM","award":["NK251E"],"award-info":[{"award-number":["NK251E"]}]},{"name":"NST\/KIMM","award":["2020M3H4A3081879"],"award-info":[{"award-number":["2020M3H4A3081879"]}]},{"name":"Ministry of Science and ICT","award":["KEIT1415187508"],"award-info":[{"award-number":["KEIT1415187508"]}]},{"name":"Ministry of Science and ICT","award":["20024772"],"award-info":[{"award-number":["20024772"]}]},{"name":"Ministry of Science and ICT","award":["NK248E"],"award-info":[{"award-number":["NK248E"]}]},{"name":"Ministry of Science and ICT","award":["NK251E"],"award-info":[{"award-number":["NK251E"]}]},{"name":"Ministry of Science and ICT","award":["2020M3H4A3081879"],"award-info":[{"award-number":["2020M3H4A3081879"]}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["JSAN"],"abstract":"<jats:p>The precise monitoring of chemical reactions in plasma-based processes is crucial for advanced semiconductor manufacturing. This study integrates three diagnostic techniques\u2014Optical Emission Spectroscopy (OES), Quadrupole Mass Spectrometry (QMS), and Time-of-Flight Mass Spectrometry (ToF-MS)\u2014into a reactive ion etcher (RIE) system to analyze CF4-based plasma. To synchronize and integrate data from these different domains, we developed a Tri-CycleGAN model that utilizes three interconnected CycleGANs for bi-directional data transformation between OES, QMS, and ToF-MS. This configuration enables accurate mapping of data across domains, effectively compensating for the blind spots of individual diagnostic techniques. The model incorporates self-attention mechanisms to address temporal misalignments and a direct loss function to preserve fine-grained features, further enhancing data accuracy. Experimental results show that the Tri-CycleGAN model achieves high consistency in reconstructing plasma measurement data under various conditions. The model\u2019s ability to fuse multi-domain diagnostic data offers a robust solution for plasma monitoring, potentially improving precision, yield, and process control in semiconductor manufacturing. This work lays a foundation for future applications of machine learning-based diagnostic integration in complex plasma environments.<\/jats:p>","DOI":"10.3390\/jsan13060075","type":"journal-article","created":{"date-parts":[[2024,11,4]],"date-time":"2024-11-04T10:57:20Z","timestamp":1730717840000},"page":"75","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":3,"title":["Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN"],"prefix":"10.3390","volume":"13","author":[{"given":"Minji","family":"Kang","sequence":"first","affiliation":[{"name":"Semiconductor Manufacturing Research Center, Korea Institute of Machinery and Materials (KIMM), Daejeon 34103, Republic of Korea"},{"name":"Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-0610-0662","authenticated-orcid":false,"given":"Sung Kyu","family":"Jang","sequence":"additional","affiliation":[{"name":"Electronic Convergence Material and Device Research Center, Korea Electronics Technology Institute (KETI), Seongnam 13509, Republic of Korea"}]},{"ORCID":"https:\/\/orcid.org\/0009-0007-8945-914X","authenticated-orcid":false,"given":"Jihun","family":"Kim","sequence":"additional","affiliation":[{"name":"Electronic Convergence Material and Device Research Center, Korea Electronics Technology Institute (KETI), Seongnam 13509, Republic of Korea"}]},{"given":"Seongho","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor Manufacturing Research Center, Korea Institute of Machinery and Materials (KIMM), Daejeon 34103, Republic of Korea"},{"name":"Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea"}]},{"given":"Changmin","family":"Kim","sequence":"additional","affiliation":[{"name":"Memory Etch Technology Team, Samsung Electronics, Pyeongtaek 17786, Republic of Korea"}]},{"given":"Hyo-Chang","family":"Lee","sequence":"additional","affiliation":[{"name":"School of Electronics and Computer Engineering, Korea Aerospace University (KAU), Goyang 10540, Republic of Korea"}]},{"given":"Wooseok","family":"Kang","sequence":"additional","affiliation":[{"name":"Semiconductor Manufacturing Research Center, Korea Institute of Machinery and Materials (KIMM), Daejeon 34103, Republic of Korea"},{"name":"Mechanical Engineering, KIMM Campus, University of Science & Technology (UST), Daejeon 34113, Republic of Korea"}]},{"given":"Min Sup","family":"Choi","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea"}]},{"given":"Hyeongkeun","family":"Kim","sequence":"additional","affiliation":[{"name":"Electronic Convergence Material and Device Research Center, Korea Electronics Technology Institute (KETI), Seongnam 13509, Republic of Korea"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-0018-9603","authenticated-orcid":false,"given":"Hyeong-U","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor Manufacturing Research Center, Korea Institute of Machinery and Materials (KIMM), Daejeon 34103, Republic of Korea"},{"name":"Nano-Mechatronics, KIMM Campus, University of Science & Technology (UST), Daejeon 34113, Republic of Korea"}]}],"member":"1968","published-online":{"date-parts":[[2024,11,4]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"159","DOI":"10.1080\/17508975.2021.1873625","article-title":"Towards a 4th industrial revolution","volume":"13","author":"Ross","year":"2021","journal-title":"Intell. 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