{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,28]],"date-time":"2025-11-28T21:08:44Z","timestamp":1764364124462,"version":"build-2065373602"},"reference-count":21,"publisher":"MDPI AG","issue":"4","license":[{"start":{"date-parts":[[2013,10,15]],"date-time":"2013-10-15T00:00:00Z","timestamp":1381795200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/3.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Micromachines"],"abstract":"<jats:p>In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within \u00b110 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.<\/jats:p>","DOI":"10.3390\/mi4040370","type":"journal-article","created":{"date-parts":[[2013,10,15]],"date-time":"2013-10-15T12:47:44Z","timestamp":1381841264000},"page":"370-377","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":10,"title":["Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography"],"prefix":"10.3390","volume":"4","author":[{"given":"Luis","family":"Villanueva","sequence":"first","affiliation":[{"name":"Microsystems Laboratory, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), Lausanne 1015, Switzerland"}]},{"given":"Oscar","family":"Vazquez-Mena","sequence":"additional","affiliation":[{"name":"Microsystems Laboratory, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), Lausanne 1015, Switzerland"}]},{"given":"Cristina","family":"Martin-Olmos","sequence":"additional","affiliation":[{"name":"Microsystems Laboratory, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), Lausanne 1015, Switzerland"}]},{"given":"Veronica","family":"Savu","sequence":"additional","affiliation":[{"name":"Institute of Physics, University of Basel, Klingelbergstrasse 82, Basel CH-4056, Switzerland"}]},{"given":"Katrin","family":"Sidler","sequence":"additional","affiliation":[{"name":"Microsystems Laboratory, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), Lausanne 1015, Switzerland"}]},{"given":"Juergen","family":"Brugger","sequence":"additional","affiliation":[{"name":"Microsystems Laboratory, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), Lausanne 1015, Switzerland"}]}],"member":"1968","published-online":{"date-parts":[[2013,10,15]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"85","DOI":"10.1126\/science.272.5258.85","article-title":"Imprint lithography with 25-nanometer resolution","volume":"272","author":"Chou","year":"1996","journal-title":"Science"},{"key":"ref_2","doi-asserted-by":"crossref","first-page":"403","DOI":"10.1016\/S0167-9317(00)00343-9","article-title":"Resistless patterning of sub-micron structures by evaporation through nanostencils","volume":"53","author":"Brugger","year":"2000","journal-title":"Microelectron. 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Microeng., 22.","DOI":"10.1088\/0960-1317\/22\/9\/095022"},{"key":"ref_9","doi-asserted-by":"crossref","first-page":"5474","DOI":"10.1021\/nn301358n","article-title":"High-resolution resistless nanopatterning on polymer and flexible substrates for plasmonic biosensing using stencil masks","volume":"6","author":"Sannomiya","year":"2012","journal-title":"ACS Nano."},{"key":"ref_10","doi-asserted-by":"crossref","first-page":"169","DOI":"10.1116\/1.3292630","article-title":"Stenciled conducting bismuth nanowires","volume":"28","author":"Savu","year":"2010","journal-title":"J. Vac. Sci. Technol. 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Nanotechnology, 20.","DOI":"10.1088\/0957-4484\/20\/41\/415303"},{"key":"ref_20","doi-asserted-by":"crossref","first-page":"857","DOI":"10.1116\/1.2737437","article-title":"Characterization and control of unconfined lateral diffusion under stencil masks","volume":"25","author":"Racz","year":"2007","journal-title":"J. Vac. Sci. Technol. 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