{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,6,27]],"date-time":"2026-06-27T01:15:11Z","timestamp":1782522911167,"version":"3.54.5"},"reference-count":21,"publisher":"MDPI AG","issue":"12","license":[{"start":{"date-parts":[[2015,12,16]],"date-time":"2015-12-16T00:00:00Z","timestamp":1450224000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>A capacitor-based circuit model is proposed to explain the electrochemical delamination of two-dimensional materials from their native substrates where produced gas bubbles squeeze into the interface. The delamination is actually the electric breakdown of the capacitor formed between the solution and substrate. To facilitate the procedure, the backside of the ubstrate has to be shielded so that the capacitor breakdown voltage can be reached. The screening effect can be induced either by nonreactive ions around the electrode or, more effectively, by an undetachable insulator. This mechanism serves as a guideline for the surface science and applications involving the bubbling delamination.<\/jats:p>","DOI":"10.3390\/s151229888","type":"journal-article","created":{"date-parts":[[2015,12,16]],"date-time":"2015-12-16T10:11:27Z","timestamp":1450260687000},"page":"31811-31820","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":8,"title":["Mechanism of Electrochemical Delamination of Two-Dimensional Materials from Their Native Substrates by Bubbling"],"prefix":"10.3390","volume":"15","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-6479-7771","authenticated-orcid":false,"given":"Jie","family":"Sun","sequence":"first","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"},{"name":"Quantum Device Physics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, G\u00f6teborg 41296, Sweden"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xing","family":"Fan","sequence":"additional","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Weiling","family":"Guo","sequence":"additional","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Lihui","family":"Liu","sequence":"additional","affiliation":[{"name":"Quantum Device Physics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, G\u00f6teborg 41296, Sweden"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xin","family":"Liu","sequence":"additional","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jun","family":"Deng","sequence":"additional","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Chen","family":"Xu","sequence":"additional","affiliation":[{"name":"Key Laboratory of Optoelectronics Technology, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2015,12,16]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"192","DOI":"10.1038\/nature11458","article-title":"A Roadmap for graphene","volume":"490","author":"Novoselov","year":"2012","journal-title":"Nature"},{"key":"ref_2","doi-asserted-by":"crossref","first-page":"255","DOI":"10.1109\/TNANO.2011.2160729","article-title":"Low partial pressure chemical vapor deposition of graphene on copper","volume":"11","author":"Sun","year":"2012","journal-title":"IEEE Trans. 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