{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T05:04:49Z","timestamp":1787029489738,"version":"3.56.0"},"reference-count":21,"publisher":"MDPI AG","issue":"12","license":[{"start":{"date-parts":[[2017,12,5]],"date-time":"2017-12-05T00:00:00Z","timestamp":1512432000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>A submicron pixel\u2019s light and dark performance were studied by experiment and simulation. An advanced node technology incorporated with a stacked CMOS image sensor (CIS) is promising in that it may enhance performance. In this work, we demonstrated a low dark current of 3.2 e\u2212\/s at 60 \u00b0C, an ultra-low read noise of 0.90 e\u2212\u00b7rms, a high full well capacity (FWC) of 4100 e\u2212, and blooming of 0.5% in 0.9 \u03bcm pixels with a pixel supply voltage of 2.8 V. In addition, the simulation study result of 0.8 \u03bcm pixels is discussed.<\/jats:p>","DOI":"10.3390\/s17122816","type":"journal-article","created":{"date-parts":[[2017,12,5]],"date-time":"2017-12-05T11:50:28Z","timestamp":1512474628000},"page":"2816","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":33,"title":["A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel"],"prefix":"10.3390","volume":"17","author":[{"given":"Seiji","family":"Takahashi","sequence":"first","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yi-Min","family":"Huang","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jhy-Jyi","family":"Sze","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Tung-Ting","family":"Wu","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Fu-Sheng","family":"Guo","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Wei-Cheng","family":"Hsu","sequence":"additional","affiliation":[{"name":"Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, 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