{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,4,7]],"date-time":"2026-04-07T16:36:29Z","timestamp":1775579789616,"version":"3.50.1"},"reference-count":34,"publisher":"MDPI AG","issue":"10","license":[{"start":{"date-parts":[[2018,10,1]],"date-time":"2018-10-01T00:00:00Z","timestamp":1538352000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>Silicon nanowires (SiNWs) have received attention in recent years due to their anomalous piezoresistive (PZR) effects. Although the PZR effects of SiNWs have been extensively researched, they are still not fully understood. Herein, we develop a new model of the PZR effects of SiNWs to characterize the PZR effects. First, the resistance of SiNW is modeled based on the surface charge density. The characteristics of SiNW, such as surface charge and effective conducting area, can be estimated by using this resistance model. Then, PZR effects are modeled based on stress concentration and piezopinch effects. Stress concentration as a function of the physical geometry of SiNWs can amplify PZR effects by an order of magnitude. The piezopinch effects can also result in increased PZR effects that are at least two times greater than that of bulk silicon. Experimental results show that the proposed model can predict the PZR effects of SiNWs accurately.<\/jats:p>","DOI":"10.3390\/s18103304","type":"journal-article","created":{"date-parts":[[2018,10,2]],"date-time":"2018-10-02T08:23:50Z","timestamp":1538468630000},"page":"3304","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":15,"title":["Characterization of the Piezoresistive Effects of Silicon Nanowires"],"prefix":"10.3390","volume":"18","author":[{"given":"Seohyeong","family":"Jang","sequence":"first","affiliation":[{"name":"Department of Electrical and Computer Engineering, Automation System Research Institute (ASRI), Inter-University Semiconductor Research Center (ISRC), Seoul National University, Seoul 08826, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jinwoo","family":"Sung","sequence":"additional","affiliation":[{"name":"Department of Electrical and Computer Engineering, Automation System Research Institute (ASRI), Inter-University Semiconductor Research Center (ISRC), Seoul National University, Seoul 08826, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Bobaro","family":"Chang","sequence":"additional","affiliation":[{"name":"Department of Electrical and Computer Engineering, Automation System Research Institute (ASRI), Inter-University Semiconductor Research Center (ISRC), Seoul National University, Seoul 08826, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Taeyup","family":"Kim","sequence":"additional","affiliation":[{"name":"Department of Electrical and Computer Engineering, Automation System Research Institute (ASRI), Inter-University Semiconductor Research Center (ISRC), Seoul National University, Seoul 08826, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5348-3585","authenticated-orcid":false,"given":"Hyoungho","family":"Ko","sequence":"additional","affiliation":[{"name":"Department of Electronics Engineering, Chungnam National University, Daejeon 34134, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-4173-9218","authenticated-orcid":false,"given":"Kyo-in","family":"Koo","sequence":"additional","affiliation":[{"name":"Department of Biomedical Engineering, University of Ulsan, Ulsan 44610, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-8040-5803","authenticated-orcid":false,"given":"Dong-il (Dan)","family":"Cho","sequence":"additional","affiliation":[{"name":"Department of Electrical and Computer Engineering, Automation System Research Institute (ASRI), Inter-University Semiconductor Research Center (ISRC), Seoul National University, Seoul 08826, Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"1968","published-online":{"date-parts":[[2018,10,1]]},"reference":[{"key":"ref_1","first-page":"247","article-title":"Silicon Nanowire-Based Devices for Gas-Phase Sensing","volume":"14","author":"Kim","year":"2014","journal-title":"Sensors"},{"key":"ref_2","doi-asserted-by":"crossref","first-page":"933","DOI":"10.1021\/nl404335p","article-title":"Artificial Sensing Intelligence with Silicon Nanowires for Ultraselective Detection in the Gas Phase","volume":"14","author":"Wang","year":"2014","journal-title":"Nano Lett."},{"key":"ref_3","doi-asserted-by":"crossref","first-page":"2990","DOI":"10.1021\/acsanm.8b00598","article-title":"Lithography-free fabrication of crystalline silicon nanowires using amorphous silicon substrate for wide-angle energy absorption applications","volume":"1","author":"Magdi","year":"2018","journal-title":"ACS Appl. 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