{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,14]],"date-time":"2026-01-14T00:58:19Z","timestamp":1768352299894,"version":"3.49.0"},"reference-count":73,"publisher":"MDPI AG","issue":"3","license":[{"start":{"date-parts":[[2021,1,28]],"date-time":"2021-01-28T00:00:00Z","timestamp":1611792000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"funder":[{"DOI":"10.13039\/100010661","name":"Horizon 2020","doi-asserted-by":"publisher","award":["851956"],"award-info":[{"award-number":["851956"]}],"id":[{"id":"10.13039\/100010661","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100008530","name":"European Regional Development Fund","doi-asserted-by":"publisher","award":["3334910"],"award-info":[{"award-number":["3334910"]}],"id":[{"id":"10.13039\/501100008530","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/100015668","name":"Laserlab-Europe","doi-asserted-by":"publisher","award":["871124"],"award-info":[{"award-number":["871124"]}],"id":[{"id":"10.13039\/100015668","id-type":"DOI","asserted-by":"publisher"}]},{"name":"Accelerator and Detector Research Program","award":["Wavefront Preserving Mirrors"],"award-info":[{"award-number":["Wavefront Preserving Mirrors"]}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.<\/jats:p>","DOI":"10.3390\/s21030874","type":"journal-article","created":{"date-parts":[[2021,1,28]],"date-time":"2021-01-28T09:03:45Z","timestamp":1611824625000},"page":"874","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":16,"title":["EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging"],"prefix":"10.3390","volume":"21","author":[{"given":"Ombeline","family":"de La Rochefoucauld","sequence":"first","affiliation":[{"name":"Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France"}]},{"given":"Guillaume","family":"Dovillaire","sequence":"additional","affiliation":[{"name":"Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France"}]},{"given":"Fabrice","family":"Harms","sequence":"additional","affiliation":[{"name":"Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France"}]},{"given":"Mourad","family":"Idir","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory, 50 Rutherford Drive, Upton, NY 11973, USA"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5645-5173","authenticated-orcid":false,"given":"Lei","family":"Huang","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory, 50 Rutherford Drive, Upton, NY 11973, USA"}]},{"given":"Xavier","family":"Levecq","sequence":"additional","affiliation":[{"name":"Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France"}]},{"given":"Martin","family":"Piponnier","sequence":"additional","affiliation":[{"name":"Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France"}]},{"given":"Philippe","family":"Zeitoun","sequence":"additional","affiliation":[{"name":"Laboratoire d\u2019Optique Appliqu\u00e9e, CNRS, ENSTA Paris, Ecole Polytechnique IP Paris, 91120 Palaiseau, France"}]}],"member":"1968","published-online":{"date-parts":[[2021,1,28]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","unstructured":"Momose, A., Takano, H., Wu, Y., Hashimoto, K., Samoto, T., Hoshino, M., Seki, Y., and Shinohara, T. 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