{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,7,8]],"date-time":"2026-07-08T04:57:31Z","timestamp":1783486651764,"version":"3.55.0"},"reference-count":55,"publisher":"MDPI AG","issue":"2","license":[{"start":{"date-parts":[[2022,1,14]],"date-time":"2022-01-14T00:00:00Z","timestamp":1642118400000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"funder":[{"DOI":"10.13039\/501100005632","name":"National Centre for Research and Development","doi-asserted-by":"publisher","award":["Rzeczy s\u0105 dla ludzi\/0089\/2020"],"award-info":[{"award-number":["Rzeczy s\u0105 dla ludzi\/0089\/2020"]}],"id":[{"id":"10.13039\/501100005632","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively.<\/jats:p>","DOI":"10.3390\/s22020651","type":"journal-article","created":{"date-parts":[[2022,1,16]],"date-time":"2022-01-16T20:45:21Z","timestamp":1642365921000},"page":"651","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":12,"title":["Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film"],"prefix":"10.3390","volume":"22","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-9635-7589","authenticated-orcid":false,"given":"Jakub","family":"Bronicki","sequence":"first","affiliation":[{"name":"Biomarkers Analysis LAB, Institute of Electronics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9970-710X","authenticated-orcid":false,"given":"Dominik","family":"Grochala","sequence":"additional","affiliation":[{"name":"Biomarkers Analysis LAB, Institute of Electronics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland"},{"name":"Advanced Diagnostic Equipment Sp. z o.o., ul. W. Weissa 7\/C1, 31-339 Krakow, Poland"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9148-1094","authenticated-orcid":false,"given":"Artur","family":"Rydosz","sequence":"additional","affiliation":[{"name":"Biomarkers Analysis LAB, Institute of Electronics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland"},{"name":"Advanced Diagnostic Equipment Sp. z o.o., ul. W. Weissa 7\/C1, 31-339 Krakow, Poland"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2022,1,14]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","unstructured":"Nowak, P., Maziarz, W., Rydosz, A., Kowalski, K., Ziabka, M., and Zakrzewska, K. (2020). SnO2\/TiO2 thin film n-n heterostructures of improved sensitivity to NO2. Sensors, 20.","DOI":"10.3390\/s20236830"},{"key":"ref_2","doi-asserted-by":"crossref","first-page":"109378","DOI":"10.1016\/j.vacuum.2020.109378","article-title":"Structure and optical properties of the WO3 thin films deposited by the GLAD magnetron sputtering technique","volume":"177","author":"Rydosz","year":"2020","journal-title":"Vacuum"},{"key":"ref_3","doi-asserted-by":"crossref","unstructured":"Rydosz, A., Dynda\u0142, K., Andrysiewicz, W., Grochala, D., and Marsza\u0142ek, K. (2020). GLAD magnetron sputtered ultra-thin copper oxide films for gas-sensing application. 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