{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,29]],"date-time":"2026-01-29T20:48:20Z","timestamp":1769719700457,"version":"3.49.0"},"reference-count":48,"publisher":"MDPI AG","issue":"4","license":[{"start":{"date-parts":[[2023,2,10]],"date-time":"2023-02-10T00:00:00Z","timestamp":1675987200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"funder":[{"name":"EMPIR program"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sensors"],"abstract":"<jats:p>We addressed the coating 5 mm-long cantilever microprobes with a viscoelastic material, which was intended to considerably extend the range of the traverse speed during the measurements of the 3D surface topography by damping contact-induced oscillations. The damping material was composed of epoxy glue, isopropyl alcohol, and glycerol, and its deposition onto the cantilever is described, as well as the tests of the completed cantilevers under free-oscillating conditions and in contact during scanning on a rough surface. The amplitude and phase of the cantilever\u2019s fundamental out-of-plane oscillation mode was investigated vs. the damping layer thickness, which was set via repeated coating steps. The resonance frequency and quality factor decreased with the increasing thickness of the damping layer for both the free-oscillating and in-contact scanning operation mode, as expected from viscoelastic theory. A very low storage modulus of E\u2032\u2248100kPa, a loss modulus of E\u2033\u2248434kPa, and a density of \u03c1\u22481.2gcm\u22123 were yielded for the damping composite. Almost critical damping was observed with an approximately 130 \u00b5m-thick damping layer in the free-oscillating case, which was effective at suppressing the ringing behavior during the high-speed in-contact probing of the rough surface topography.<\/jats:p>","DOI":"10.3390\/s23042003","type":"journal-article","created":{"date-parts":[[2023,2,10]],"date-time":"2023-02-10T05:51:06Z","timestamp":1676008266000},"page":"2003","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":4,"title":["Damped Cantilever Microprobes for High-Speed Contact Metrology with 3D Surface Topography"],"prefix":"10.3390","volume":"23","author":[{"ORCID":"https:\/\/orcid.org\/0000-0003-1027-9968","authenticated-orcid":false,"given":"Michael","family":"Fahrbach","sequence":"first","affiliation":[{"name":"Institute of Semiconductor Technology (IHT), Technische Universit\u00e4t Braunschweig, Hans-Sommer-Stra\u00dfe 66, 38106 Braunschweig, Germany"},{"name":"Laboratory for Emerging Nanometrology (LENA), Langer Kamp 6a\/b, 38106 Braunschweig, Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5115-5737","authenticated-orcid":false,"given":"Min","family":"Xu","sequence":"additional","affiliation":[{"name":"Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3927-2439","authenticated-orcid":false,"given":"Wilson Ombati","family":"Nyang\u2019au","sequence":"additional","affiliation":[{"name":"Institute of Semiconductor Technology (IHT), Technische Universit\u00e4t Braunschweig, Hans-Sommer-Stra\u00dfe 66, 38106 Braunschweig, Germany"},{"name":"Laboratory for Emerging Nanometrology (LENA), Langer Kamp 6a\/b, 38106 Braunschweig, Germany"},{"name":"Department of Metrology, Kenya Bureau of Standards (KEBS), Popo Rd, Nairobi 00200, Kenya"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5127-4496","authenticated-orcid":false,"given":"Oleg","family":"Domanov","sequence":"additional","affiliation":[{"name":"GETec Microscopy GmbH, Am Heumarkt 13, 1030 Vienna, Austria"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-2730-8059","authenticated-orcid":false,"given":"Christian H.","family":"Schwalb","sequence":"additional","affiliation":[{"name":"GETec Microscopy GmbH, Am Heumarkt 13, 1030 Vienna, Austria"},{"name":"Quantum Design Microscopy GmbH, Im Tiefen See 60a, 64293 Darmstadt, Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7931-2992","authenticated-orcid":false,"given":"Zhi","family":"Li","sequence":"additional","affiliation":[{"name":"Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany"}]},{"given":"Christian","family":"Kuhlmann","sequence":"additional","affiliation":[{"name":"Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-4293-4982","authenticated-orcid":false,"given":"Uwe","family":"Brand","sequence":"additional","affiliation":[{"name":"Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5801-813X","authenticated-orcid":false,"given":"Erwin","family":"Peiner","sequence":"additional","affiliation":[{"name":"Institute of Semiconductor Technology (IHT), Technische Universit\u00e4t Braunschweig, Hans-Sommer-Stra\u00dfe 66, 38106 Braunschweig, Germany"},{"name":"Laboratory for Emerging Nanometrology (LENA), Langer Kamp 6a\/b, 38106 Braunschweig, Germany"}]}],"member":"1968","published-online":{"date-parts":[[2023,2,10]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"4271","DOI":"10.1007\/s00170-022-09084-5","article-title":"Optical metrology for digital manufacturing: A review","volume":"120","author":"Catalucci","year":"2022","journal-title":"Int. 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