{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,14]],"date-time":"2026-09-14T01:56:09Z","timestamp":1789350969073,"version":"build-2803163510"},"reference-count":29,"publisher":"MDPI AG","issue":"6","license":[{"start":{"date-parts":[[2016,6,3]],"date-time":"2016-06-03T00:00:00Z","timestamp":1464912000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IJMS"],"abstract":"<jats:p>The metallization of porous silicon (PSi) is generally realized through physical vapor deposition (PVD) or electrochemical processes using aqueous solutions. The former uses a strong vacuum and does not allow for a conformal deposition into the pores. In the latter, the water used as solvent causes oxidation of the silicon during the reduction of the salt precursors. Moreover, as PSi is hydrophobic, the metal penetration into the pores is restricted to the near-surface region. Using a solution of organometallic (OM) precursors in ionic liquid (IL), we have developed an easy and efficient way to fully metallize the pores throughout the several-\u00b5m-thick porous Si. This process affords supported metallic nanoparticles characterized by a narrow size distribution. This process is demonstrated for different metals (Pt, Pd, Cu, and Ru) and can probably be extended to other metals. Moreover, as no reducing agent is necessary (the decomposition in an argon atmosphere at 50 \u00b0C is fostered by surface silicon hydride groups borne by PSi), the safety and the cost of the process are improved.<\/jats:p>","DOI":"10.3390\/ijms17060876","type":"journal-article","created":{"date-parts":[[2016,6,3]],"date-time":"2016-06-03T10:37:37Z","timestamp":1464950257000},"page":"876","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":4,"title":["An Efficient, Versatile, and Safe Access to Supported Metallic Nanoparticles on Porous Silicon with Ionic Liquids"],"prefix":"10.3390","volume":"17","author":[{"given":"Walid","family":"Darwich","sequence":"first","affiliation":[{"name":"CNRS-Universit\u00e9 de Lyon-ESCPE Lyon, UMR 5265 C2P2, 43 Bd du 11 Novembre 1918, Villeurbanne 69616, France"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Paul-Henri","family":"Haumesser","sequence":"additional","affiliation":[{"name":"CEA, LETI, MINATEC Campus, Grenoble 38054, France"},{"name":"Universit\u00e9 Grenoble Alpes, Grenoble 38000, France"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Catherine","family":"Santini","sequence":"additional","affiliation":[{"name":"CNRS-Universit\u00e9 de Lyon-ESCPE Lyon, UMR 5265 C2P2, 43 Bd du 11 Novembre 1918, Villeurbanne 69616, France"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Fr\u00e9d\u00e9ric","family":"Gaillard","sequence":"additional","affiliation":[{"name":"CEA, LETI, MINATEC Campus, Grenoble 38054, France"},{"name":"Universit\u00e9 Grenoble Alpes, Grenoble 38000, France"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2016,6,3]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"1051","DOI":"10.1039\/a900108e","article-title":"Organometallic chemistry on silicon surfaces: Formation of functional monolayers bound through Si-C bonds","volume":"12","author":"Buriak","year":"1999","journal-title":"Chem. 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