{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,15]],"date-time":"2026-10-15T02:30:28Z","timestamp":1792031428960,"version":"4.4.0"},"reference-count":67,"publisher":"MDPI AG","issue":"20","license":[{"start":{"date-parts":[[2025,10,16]],"date-time":"2025-10-16T00:00:00Z","timestamp":1760572800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Nanomaterials"],"abstract":"<jats:p>Directed self-assembly (DSA) of polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) has garnered substantial interest for semiconductor manufacturing, particularly for fabricating contact holes and vias. However, its application is limited by the low etch selectivity between the PS and PMMA domains. Here, we report an acid-responsive block copolymer, PS-N=CH-PMMA, incorporating a Schiff base (-N=CH-) linkage between the two blocks to impart acid sensitivity. The copolymer is synthesized via aldehyde-terminated PMMA (PMMA-CHO) precursors and is fully compatible with conventional thermal annealing workflows used for PS-b-PMMA. Uniform thin films with vertically oriented cylindrical domains were obtained, which could be directly converted into high-fidelity PS masks through acetic acid immersion without UV exposure. Graphoepitaxial DSA in 193i pre-patterned templates produced shrink-hole patterns with reduced critical dimension (CD) and improved local CD uniformity (LCDU). The shrink-hole CD was tunable by varying PMMA-CHO molecular weights. XPS confirmed selective cleavage of Schiff base linkages at the PS\/PMMA interface under acidic conditions, while Ohta\u2013Kawasaki simulations indicated interfacial wetting asymmetry governs etch fidelity and residual layer formation. Pattern transfer into TEOS layers was achieved with minimal CD loss. Overall, the acid-cleavable BCP enables scalable, high-fidelity nanopatterning with improved etch contrast, tunable process windows, and seamless integration into existing PS-b-PMMA lithography platforms.<\/jats:p>","DOI":"10.3390\/nano15201571","type":"journal-article","created":{"date-parts":[[2025,10,16]],"date-time":"2025-10-16T07:29:38Z","timestamp":1760599778000},"page":"1571","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":2,"title":["Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer"],"prefix":"10.3390","volume":"15","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-5416-492X","authenticated-orcid":false,"given":"Jianghao","family":"Zhan","sequence":"first","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jiacheng","family":"Luo","sequence":"additional","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Zixin","family":"Zhuo","sequence":"additional","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0006-0676-3019","authenticated-orcid":false,"given":"Caiwei","family":"Shang","sequence":"additional","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9921-6394","authenticated-orcid":false,"given":"Zili","family":"Li","sequence":"additional","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Shisheng","family":"Xiong","sequence":"additional","affiliation":[{"name":"Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China"},{"name":"Zhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2025,10,16]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"12955","DOI":"10.1021\/acsnano.3c01927","article-title":"A researcher\u2019s perspective on unconventional lab-to-fab for 2D semiconductor devices","volume":"17","author":"Iyengar","year":"2023","journal-title":"ACS Nano"},{"key":"ref_2","doi-asserted-by":"crossref","first-page":"895","DOI":"10.1038\/s41565-024-01695-1","article-title":"The future of two-dimensional semiconductors beyond Moore\u2019s law","volume":"19","author":"Kim","year":"2024","journal-title":"Nat. Nanotechnol."},{"key":"ref_3","doi-asserted-by":"crossref","first-page":"153","DOI":"10.1186\/s11671-023-03938-x","article-title":"Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications","volume":"18","author":"Stokes","year":"2023","journal-title":"Discov. Nano"},{"key":"ref_4","first-page":"9","article-title":"Chemical approach to make the most of EUVL: Stochastic effect mitigation with developer and rinse","volume":"Volume 12494","author":"Ryu","year":"2023","journal-title":"Optical and EUV Nanolithography XXXVI, San Jose, CA, USA, 26 February\u20132 March 2023"},{"key":"ref_5","first-page":"142","article-title":"Substantial dose reduction using dry deposited underlayer for EUV lithography while maintaining roughness and minimizing defects","volume":"Volume 13215","author":"Kundu","year":"2024","journal-title":"Proceedings of the International Conference on Extreme Ultraviolet Lithography 2024"},{"key":"ref_6","doi-asserted-by":"crossref","first-page":"31988","DOI":"10.1039\/C4RA02498B","article-title":"Fabrication of PDMS micro through-holes using micromolding in open capillaries","volume":"4","author":"Zhou","year":"2014","journal-title":"RSC Adv."},{"key":"ref_7","doi-asserted-by":"crossref","first-page":"3643","DOI":"10.1021\/nl401484x","article-title":"Logic-gate devices based on printed polymer semiconducting nanostripes","volume":"13","author":"Gentili","year":"2013","journal-title":"Nano Lett."},{"key":"ref_8","doi-asserted-by":"crossref","first-page":"7666","DOI":"10.1021\/acsnano.7b03284","article-title":"Self-registered self-assembly of block copolymers","volume":"11","author":"Wan","year":"2017","journal-title":"ACS Nano"},{"key":"ref_9","doi-asserted-by":"crossref","first-page":"032006","DOI":"10.1088\/2631-7990\/aba3ae","article-title":"Directed self-assembly of block copolymers for sub-10 nm fabrication","volume":"2","author":"Chen","year":"2020","journal-title":"Int. J. Extrem. Manuf."},{"key":"ref_10","doi-asserted-by":"crossref","first-page":"15182","DOI":"10.1021\/acsnano.0c05417","article-title":"Self-directed self-assembly of 3D tailored block copolymer nanostructures","volume":"14","author":"Huang","year":"2020","journal-title":"ACS Nano"},{"key":"ref_11","doi-asserted-by":"crossref","first-page":"1583","DOI":"10.1002\/adma.200300382","article-title":"Block copolymers as a tool for nanomaterial fabrication","volume":"15","author":"Lazzari","year":"2003","journal-title":"Adv. Mater."},{"key":"ref_12","doi-asserted-by":"crossref","first-page":"146","DOI":"10.1021\/cr900159v","article-title":"Block copolymer based nanostructures: Materials, processes, and applications to electronics","volume":"110","author":"Kim","year":"2010","journal-title":"Chem. Rev."},{"key":"ref_13","doi-asserted-by":"crossref","first-page":"3867","DOI":"10.1039\/c3sm52607k","article-title":"Directed self-assembly of block copolymers: A tutorial review of strategies for enabling nanotechnology with soft matter","volume":"10","author":"Hu","year":"2014","journal-title":"Soft Matter"},{"key":"ref_14","doi-asserted-by":"crossref","first-page":"76","DOI":"10.1016\/j.progpolymsci.2015.10.006","article-title":"Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication","volume":"54","author":"Ji","year":"2016","journal-title":"Prog. Polym. Sci."},{"key":"ref_15","doi-asserted-by":"crossref","first-page":"47","DOI":"10.1016\/j.progpolymsci.2015.10.008","article-title":"Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics","volume":"54","author":"Li","year":"2016","journal-title":"Prog. Polym. Sci."},{"key":"ref_16","doi-asserted-by":"crossref","first-page":"25357","DOI":"10.1021\/acsami.1c03830","article-title":"Understanding kinetics of defect annihilation in chemoepitaxy-directed self-assembly","volume":"13","author":"Li","year":"2021","journal-title":"ACS Appl. Mater. Interfaces"},{"key":"ref_17","doi-asserted-by":"crossref","unstructured":"Radamson, H.H., Zhu, H., Wu, Z., He, X., Lin, H., Liu, J., Xiang, J., Kong, Z., Xiong, W., and Li, J. (2020). State of the art and future perspectives in advanced CMOS technology. Nanomaterials, 10.","DOI":"10.3390\/nano10081555"},{"key":"ref_18","doi-asserted-by":"crossref","first-page":"2200659","DOI":"10.1002\/adma.202200659","article-title":"Review of semiconductor flash memory devices for material and process issues","volume":"35","author":"Kim","year":"2023","journal-title":"Adv. Mater."},{"key":"ref_19","doi-asserted-by":"crossref","first-page":"8819","DOI":"10.1021\/ma501679a","article-title":"A Landau\u2013Peierls Analysis of Contact Hole Placement in Directed Self-Assembly of Linear Arrays of Block Copolymer Cylinders","volume":"47","author":"Laachi","year":"2014","journal-title":"Macromolecules"},{"key":"ref_20","doi-asserted-by":"crossref","first-page":"21","DOI":"10.2494\/photopolymer.26.21","article-title":"Electrical via chain yield for DSA contact hole shrink process","volume":"26","author":"Kato","year":"2013","journal-title":"J. Photopolym. Sci. Technol."},{"key":"ref_21","doi-asserted-by":"crossref","first-page":"21389","DOI":"10.1021\/am506391n","article-title":"High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications","volume":"6","author":"Giammaria","year":"2014","journal-title":"ACS Appl. Mater. Interfaces"},{"key":"ref_22","first-page":"87","article-title":"Etch challenges for DSA implementation in CMOS via patterning","volume":"Volume 9054","author":"Barros","year":"2014","journal-title":"Proceedings of the Advanced Etch Technology for Nanopatterning III"},{"key":"ref_23","doi-asserted-by":"crossref","first-page":"649","DOI":"10.3390\/polym2040649","article-title":"Surface roughening of polystyrene and poly (methyl methacrylate) in Ar\/O2 plasma etching","volume":"2","author":"Ting","year":"2010","journal-title":"Polymers"},{"key":"ref_24","doi-asserted-by":"crossref","first-page":"031301","DOI":"10.1116\/1.5004648","article-title":"Etch considerations for directed self-assembly patterning using capacitively coupled plasma","volume":"36","author":"Rastogi","year":"2018","journal-title":"J. Vac. Sci. Technol. A"},{"key":"ref_25","doi-asserted-by":"crossref","first-page":"030601","DOI":"10.1116\/1.5090395","article-title":"New CH4-N2 dry etch chemistry for poly (methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application","volume":"37","author":"Sarrazin","year":"2019","journal-title":"J. Vac. Sci. Technol. B"},{"key":"ref_26","first-page":"39","article-title":"Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers","volume":"Volume 10589","author":"Chevalier","year":"2018","journal-title":"Proceedings of the Advanced Etch Technology for Nanopatterning VII"},{"key":"ref_27","doi-asserted-by":"crossref","first-page":"569","DOI":"10.2494\/photopolymer.28.569","article-title":"High selective plasma etching of PMMA to PS","volume":"28","author":"Shimomukai","year":"2015","journal-title":"J. Photopolym. Sci. Technol."},{"key":"ref_28","first-page":"145","article-title":"Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface","volume":"9","author":"Yabagi","year":"2017","journal-title":"J. Sci. Technol."},{"key":"ref_29","doi-asserted-by":"crossref","first-page":"044505","DOI":"10.1117\/1.JMM.14.4.044505","article-title":"Dry development for a directed self-assembly lithography hole-shrink process using CO\/H2 plasma","volume":"14","author":"Omura","year":"2015","journal-title":"J. Micro Nanolithography MEMS MOEMS"},{"key":"ref_30","doi-asserted-by":"crossref","first-page":"8651","DOI":"10.1021\/ma101827u","article-title":"Monitoring PMMA elimination by reactive ion etching from a lamellar PS-b-PMMA thin film by ex situ TEM methods","volume":"43","author":"Farrell","year":"2010","journal-title":"Macromolecules"},{"key":"ref_31","doi-asserted-by":"crossref","first-page":"554","DOI":"10.3390\/macromol3030032","article-title":"Development of Water-Resistant Autohesive Strength of Polyethylene Plates with Photografting of Alkyl (Meth) Acrylates","volume":"3","author":"Yamada","year":"2023","journal-title":"Macromol"},{"key":"ref_32","doi-asserted-by":"crossref","unstructured":"Lei, P.-H., Yang, P.-C., and Huang, P.-C. (2021). Investigation of photonic-crystal-structured p-GaN nanorods fabricated by polystyrene nanosphere lithography method to improve the light extraction efficiency of InGaN\/GaN green light-emitting diodes. Materials, 14.","DOI":"10.3390\/ma14092200"},{"key":"ref_33","doi-asserted-by":"crossref","first-page":"2200962","DOI":"10.1002\/admi.202200962","article-title":"High-Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS-b-PMMA Block Copolymer Nanomasks during Mask Development","volume":"9","author":"Venugopal","year":"2022","journal-title":"Adv. Mater. Interfaces"},{"key":"ref_34","doi-asserted-by":"crossref","first-page":"205303","DOI":"10.1088\/1361-6528\/acb6df","article-title":"Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives","volume":"34","author":"Hao","year":"2023","journal-title":"Nanotechnology"},{"key":"ref_35","doi-asserted-by":"crossref","first-page":"051602","DOI":"10.1116\/1.4929548","article-title":"PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication","volume":"33","author":"Gharbi","year":"2015","journal-title":"J. Vac. Sci. Technol. B"},{"key":"ref_36","doi-asserted-by":"crossref","first-page":"061802","DOI":"10.1116\/1.4964881","article-title":"PMMA removal selectivity to polystyrene using dry etch approach","volume":"34","author":"Sarrazin","year":"2016","journal-title":"J. Vac. Sci. Technol. B"},{"key":"ref_37","first-page":"374","article-title":"Wet etch process for high-resolution DSA patterning for advanced node DRAM","volume":"Volume 12957","author":"Wu","year":"2024","journal-title":"Proceedings of the Advances in Patterning Materials and Processes XLI"},{"key":"ref_38","doi-asserted-by":"crossref","first-page":"787","DOI":"10.1002\/(SICI)1521-4095(200006)12:11<787::AID-ADMA787>3.0.CO;2-1","article-title":"Nanoscopic templates from oriented block copolymer films","volume":"12","author":"Steiner","year":"2000","journal-title":"Adv. Mater."},{"key":"ref_39","doi-asserted-by":"crossref","first-page":"5586","DOI":"10.1002\/adma.201503432","article-title":"Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application","volume":"28","author":"Cummins","year":"2016","journal-title":"Adv. Mater."},{"key":"ref_40","doi-asserted-by":"crossref","unstructured":"Pola, R., V\u00edcha, M., Trousil, J., Grosmanov\u00e1, E., Pechar, M., Rumlerov\u00e1, A., Studenovsk\u00fd, M., Ku\u010derov\u00e1, E., Ulbrich, P., and Vokat\u00e1, B. (2023). Polymer-antimicrobial peptide constructs with tailored drug-release behavior. Pharmaceutics, 15.","DOI":"10.3390\/pharmaceutics15020406"},{"key":"ref_41","doi-asserted-by":"crossref","first-page":"1597","DOI":"10.1021\/cr400559g","article-title":"Molecular assembly of Schiff base interactions: Construction and application","volume":"115","author":"Jia","year":"2015","journal-title":"Chem. Rev."},{"key":"ref_42","doi-asserted-by":"crossref","first-page":"1208","DOI":"10.1016\/j.ijbiomac.2020.07.008","article-title":"An injectable hydrogel with pH-sensitive and self-healing properties based on 4armPEGDA and N-carboxyethyl chitosan for local treatment of hepatocellular carcinoma","volume":"163","author":"Zhan","year":"2020","journal-title":"Int. J. Biol. Macromol."},{"key":"ref_43","doi-asserted-by":"crossref","first-page":"3045","DOI":"10.1039\/c2py20290e","article-title":"Schiff\u2019s base as a stimuli-responsive linker in polymer chemistry","volume":"3","author":"Xin","year":"2012","journal-title":"Polym. Chem."},{"key":"ref_44","doi-asserted-by":"crossref","first-page":"e624","DOI":"10.1002\/agt2.624","article-title":"Construction and modulation of aggregation-induced emission materials based on dynamic covalent bonds","volume":"5","author":"Zheng","year":"2024","journal-title":"Aggregate"},{"key":"ref_45","doi-asserted-by":"crossref","first-page":"3427","DOI":"10.1039\/c2cc17397b","article-title":"Synthesis and self-assembly of dynamic covalent block copolymers: Towards a general route to pore-functionalized membranes","volume":"48","author":"Rao","year":"2012","journal-title":"Chem. Commun."},{"key":"ref_46","doi-asserted-by":"crossref","first-page":"7569","DOI":"10.1039\/c0cc02654a","article-title":"Self-assembled encapsulation systems with pH tunable release property based on reversible covalent bond","volume":"46","author":"He","year":"2010","journal-title":"Chem. Commun."},{"key":"ref_47","doi-asserted-by":"crossref","unstructured":"Zhan, J., Shang, C., Niu, M., Luo, J., Gao, S., Wu, Z., Niu, S., Xu, Y., Zhang, X., and Li, Z. (2025). An Acid-Cleavable Lamellar Block Copolymer for Sub-30-nm Line Spacing Patterning via Graphoepitaxial Directed Self-Assembly and Direct Wet Etching. Polymers, 17.","DOI":"10.3390\/polym17182435"},{"key":"ref_48","doi-asserted-by":"crossref","first-page":"4132","DOI":"10.1002\/pola.20182","article-title":"Atom transfer radical polymerization of methyl methacrylate at ambient temperature using soluble Cu (I) complex catalysts formed with mixed ligands of multidentate amines and halide ions","volume":"42","author":"Chatterjee","year":"2004","journal-title":"J. Polym. Sci. Part A Polym. Chem."},{"key":"ref_49","doi-asserted-by":"crossref","first-page":"1217","DOI":"10.1007\/s10118-018-2139-2","article-title":"Effect of Halogen Chain End Fidelity on the Synthesis of Poly (methyl methacrylate-b-styrene) by ATRP","volume":"36","author":"Huang","year":"2018","journal-title":"Chin. J. Polym. Sci."},{"key":"ref_50","doi-asserted-by":"crossref","first-page":"799","DOI":"10.1021\/acsmacrolett.2c00270","article-title":"Compensation for orientation birefringence of PMMA by blending bottlebrush polymers composed of well-controlled graft chains","volume":"11","author":"Tamura","year":"2022","journal-title":"ACS Macro Lett."},{"key":"ref_51","doi-asserted-by":"crossref","first-page":"2704","DOI":"10.1039\/C4PY00001C","article-title":"Introducing the Ugi reaction into polymer chemistry as a green click reaction to prepare middle-functional block copolymers","volume":"5","author":"Yang","year":"2014","journal-title":"Polym. Chem."},{"key":"ref_52","doi-asserted-by":"crossref","first-page":"1876","DOI":"10.1021\/ma102856t","article-title":"Fabrication of lithographically defined chemically patterned polymer brushes and mats","volume":"44","author":"Liu","year":"2011","journal-title":"Macromolecules"},{"key":"ref_53","doi-asserted-by":"crossref","first-page":"031305","DOI":"10.1117\/1.JMM.13.3.031305","article-title":"Optimization of directed self-assembly hole shrink process with simplified model","volume":"13","author":"Yoshimoto","year":"2014","journal-title":"J. Micro Nanolithography MEMS MOEMS"},{"key":"ref_54","doi-asserted-by":"crossref","first-page":"e23416","DOI":"10.1016\/j.heliyon.2023.e23416","article-title":"Steglich esterification: A versatile synthetic approach toward the synthesis of natural products, their analogues\/derivatives","volume":"10","author":"Munawar","year":"2024","journal-title":"Heliyon"},{"key":"ref_55","doi-asserted-by":"crossref","first-page":"6466","DOI":"10.1021\/ma990812j","article-title":"Stereospecific anionic polymerization of N, N-dialkylacrylamides","volume":"32","author":"Kobayashi","year":"1999","journal-title":"Macromolecules"},{"key":"ref_56","doi-asserted-by":"crossref","first-page":"7180","DOI":"10.1021\/am5003074","article-title":"Fine tuning of lithographic masks through thin films of PS-b-PMMA with different molar mass by rapid thermal processing","volume":"6","author":"Giammaria","year":"2014","journal-title":"ACS Appl. Mater. Interfaces"},{"key":"ref_57","doi-asserted-by":"crossref","first-page":"2535","DOI":"10.1039\/C8TC06480F","article-title":"Fast self-assembly of polystyrene-b-poly (fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications","volume":"7","author":"Li","year":"2019","journal-title":"J. Mater. Chem. C"},{"key":"ref_58","doi-asserted-by":"crossref","first-page":"6733","DOI":"10.1021\/acs.macromol.7b00743","article-title":"Controlling block copolymer\u2013substrate interactions by homopolymer brushes\/mats","volume":"50","author":"Pang","year":"2017","journal-title":"Macromolecules"},{"key":"ref_59","doi-asserted-by":"crossref","first-page":"6920","DOI":"10.1039\/c1sm05562c","article-title":"Perpendicular orientation of microdomains in PS-b-PMMA thin films on the PS brushed substrates","volume":"7","author":"Guo","year":"2011","journal-title":"Soft Matter"},{"key":"ref_60","doi-asserted-by":"crossref","first-page":"1458","DOI":"10.1126\/science.275.5305.1458","article-title":"Controlling Polymer-Surface Interactions with Random Copolymer Brushes","volume":"275","author":"Mansky","year":"1997","journal-title":"Science"},{"key":"ref_61","doi-asserted-by":"crossref","first-page":"5299","DOI":"10.1021\/ma990483v","article-title":"Neutrality Conditions for Block Copolymer Systems on Random Copolymer Brush Surfaces","volume":"32","author":"Huang","year":"1999","journal-title":"Macromolecules"},{"key":"ref_62","doi-asserted-by":"crossref","first-page":"2007761","DOI":"10.1002\/adma.202007761","article-title":"Dual-crosslinked dynamic hydrogel incorporating {Mo154} with pH and NIR responsiveness for chemo-photothermal therapy","volume":"33","author":"Guedes","year":"2021","journal-title":"Adv. Mater."},{"key":"ref_63","doi-asserted-by":"crossref","first-page":"2109789","DOI":"10.1002\/adma.202109789","article-title":"Cascade-targeting poly (amino acid) nanoparticles eliminate intracellular bacteria via on-site antibiotic delivery","volume":"34","author":"Feng","year":"2022","journal-title":"Adv. Mater."},{"key":"ref_64","doi-asserted-by":"crossref","first-page":"10126","DOI":"10.1021\/ma034976i","article-title":"Precise control of nanopore size in thin film using mixtures of asymmetric block copolymer and homopolymer","volume":"36","author":"Jeong","year":"2003","journal-title":"Macromolecules"},{"key":"ref_65","doi-asserted-by":"crossref","first-page":"1181","DOI":"10.1002\/marc.200400060","article-title":"The formation of ordered nanoholes in binary, chemically similar, symmetric diblock copolymer blend films","volume":"25","author":"Xuan","year":"2004","journal-title":"Macromol. Rapid Commun."},{"key":"ref_66","doi-asserted-by":"crossref","first-page":"8918","DOI":"10.1021\/acs.macromol.2c01585","article-title":"Mesoporous Phenolic\/POSS Hybrids Induced by Microphase Separation Arising from Competitive Hydrogen Bonding Interactions","volume":"55","author":"Huang","year":"2022","journal-title":"Macromolecules"},{"key":"ref_67","first-page":"033503","article-title":"Dual brush process for selective surface modification in graphoepitaxy directed self-assembly","volume":"16","author":"Doise","year":"2017","journal-title":"J. Micro Nanolithography MEMS MOEMS"}],"container-title":["Nanomaterials"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/www.mdpi.com\/2079-4991\/15\/20\/1571\/pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,10,16]],"date-time":"2025-10-16T08:01:26Z","timestamp":1760601686000},"score":1,"resource":{"primary":{"URL":"https:\/\/www.mdpi.com\/2079-4991\/15\/20\/1571"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,10,16]]},"references-count":67,"journal-issue":{"issue":"20","published-online":{"date-parts":[[2025,10]]}},"alternative-id":["nano15201571"],"URL":"https:\/\/doi.org\/10.3390\/nano15201571","relation":{},"ISSN":["2079-4991"],"issn-type":[{"value":"2079-4991","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025,10,16]]}}}