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However, existing Hf-based dry hybrid photoresists often struggle to provide sufficient dissolution contrast for clean pattern formation under mild development, as unexposed regions are not fully removed. In this work, an ether-containing hafnium-based photoresist was fabricated by molecular layer deposition (MLD). Incorporation of the diethylene glycol (DEG)-derived ether unit modifies the local coordination environment of the hybrid film and enhances the removability of the unexposed regions, enabling removal in 0.1 M HCl. FTIR and XPS analyses reveal that exposure disrupts Hf-O-C coordination motifs and converts the initial hybrid network into a more HfOx-rich, less soluble framework. This combination of enhanced solubility in the unexposed regions and exposure-induced stabilization in the exposed regions establishes sufficient dissolution contrast for mild-acid negative-tone development. E-beam tests show a critical dose of approximately 250 \u03bcC\u00b7cm\u22122 and reproducible patterning down to 50 nm. These results identify DEG-mediated ether incorporation as an effective route to improving developer compatibility in Hf-based MLD dry resists.<\/jats:p>","DOI":"10.3390\/nano16120726","type":"journal-article","created":{"date-parts":[[2026,6,17]],"date-time":"2026-06-17T05:56:31Z","timestamp":1781675791000},"page":"726","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["An Ether-Containing Hafnium\u2013Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development"],"prefix":"10.3390","volume":"16","author":[{"given":"Chao","family":"Shi","sequence":"first","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, Tianjin 300350, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yixian","family":"Wang","sequence":"additional","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, Tianjin 300350, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Zimai","family":"Wang","sequence":"additional","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, 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China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Linyang","family":"Li","sequence":"additional","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, Tianjin 300350, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xianhaoyan","family":"Chen","sequence":"additional","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, Tianjin 300350, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yuan","family":"Cai","sequence":"additional","affiliation":[{"name":"Zhejiang Institute of Tianjin University, Ningbo 315201, China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9862-5038","authenticated-orcid":false,"given":"Tuo","family":"Wang","sequence":"additional","affiliation":[{"name":"School of Chemical Engineering & Technology, Key Laboratory for Green Chemical Technology of Ministry of Education, Collaborative Innovation Center for Chemical Science & Engineering, Tianjin University, Tianjin 300072, China"},{"name":"International Joint Laboratory of Low-Carbon Chemical Engineering of Ministry of Education, Tianjin 300350, China"},{"name":"Haihe Laboratory of Sustainable Chemical Transformations, Tianjin 300192, China"},{"name":"Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Fuzhou 350207, China"},{"name":"National Industry-Education Platform of Energy Storage, Tianjin 300350, China"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2026,6,11]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"153","DOI":"10.1146\/annurev.matsci.28.1.153","article-title":"Soft Lithography","volume":"28","author":"Xia","year":"1998","journal-title":"Annu. 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