{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,2]],"date-time":"2026-10-02T19:43:41Z","timestamp":1790970221544,"version":"4.1.0"},"reference-count":54,"publisher":"MDPI AG","issue":"15","license":[{"start":{"date-parts":[[2026,8,2]],"date-time":"2026-08-02T00:00:00Z","timestamp":1785628800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"funder":[{"name":"Korea Government","award":["RS-2024-00409639"],"award-info":[{"award-number":["RS-2024-00409639"]}]},{"name":"Korea Government","award":["RS-2023-00281517"],"award-info":[{"award-number":["RS-2023-00281517"]}]},{"name":"Ministry of Education","award":["2026-ANCHOR-06-013"],"award-info":[{"award-number":["2026-ANCHOR-06-013"]}]},{"name":"Nano-Semiconductor Convergence Research Institute of Hannam University"},{"id":[{"id":"https:\/\/ror.org\/01cwbae71","id-type":"ROR","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Polymers"],"abstract":"<jats:p>This study reports poly(acrylic acid) (PAA)-containing ceria slurries for shallow trench isolation (STI) chemical mechanical polishing (CMP). HNU15 ceria nanoparticles were prepared by precipitation at room temperature. PAA was synthesized by aqueous free-radical polymerization, characterized by gel permeation chromatography and Fourier-transform infrared spectroscopy, and used as the polymeric dispersant in both HNU15 and commercial HC10 slurries. The primary-particle sizes determined by TEM were 12.2 \u00b1 1.5 nm for HNU15 and 14.6 \u00b1 1.4 nm for HC10, whereas the crystallite sizes calculated from XRD were 10.2 nm and 8.7 nm, respectively. HNU15 showed a higher BET surface area and Ce3+ fraction than HC10, indicating measurable differences in textural properties and surface chemical states. After 5 h of milling, the HNU15 and HC10 slurries exhibited DLS d50 values of 111 nm and 122 nm and zeta potentials of \u221253.60 mV and \u221249.40 mV, respectively. Both slurries maintained generally stable colloidal properties during four weeks of storage at 25 \u00b0C and 60 \u00b0C. Under the laboratory CMP conditions, HNU15 slurry exhibited an HDP-SiO2 removal rate of 114.4 \u00c5 min\u22121, an HDP-SiO2-to-Si3N4 selectivity of 8.0, and lower post-polishing roughness than HC10. These results support the use of the PAA-containing HNU15 slurry for STI CMP applications.<\/jats:p>","DOI":"10.3390\/polym18151899","type":"journal-article","created":{"date-parts":[[2026,8,3]],"date-time":"2026-08-03T01:43:27Z","timestamp":1785721407000},"page":"1899","update-policy":"https:\/\/doi.org\/10.3390\/mdpi_crossmark_policy","source":"Crossref","is-referenced-by-count":1,"title":["Poly(acrylic acid)-Containing Ceria Slurries for Shallow Trench Isolation Chemical Mechanical Polishing: Colloidal Stability, Planarization Efficiency, and Selectivity"],"prefix":"10.3390","volume":"18","author":[{"given":"Sohee","family":"Hwang","sequence":"first","affiliation":[{"name":"Department of Chemistry, Hannam University, Daejeon 34430, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0000-7191-238X","authenticated-orcid":false,"given":"Tao","family":"Lyu","sequence":"additional","affiliation":[{"name":"Department of Nanomaterials and Semiconductor, Hannam University, Daejeon 34430, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1787-8939","authenticated-orcid":false,"given":"Woonjung","family":"Kim","sequence":"additional","affiliation":[{"name":"Department of Chemistry, Hannam University, Daejeon 34430, Republic of Korea"},{"name":"Department of Nanomaterials and Semiconductor, Hannam University, Daejeon 34430, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"1968","published-online":{"date-parts":[[2026,8,2]]},"reference":[{"key":"ref_1","doi-asserted-by":"crossref","first-page":"8475","DOI":"10.1039\/c2ee22310d","article-title":"Nanostructured ceria-based materials: Synthesis, properties, and applications","volume":"5","author":"Sun","year":"2012","journal-title":"Energy Environ. 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