{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,2,8]],"date-time":"2026-02-08T08:26:49Z","timestamp":1770539209963,"version":"3.49.0"},"reference-count":0,"publisher":"SCITEPRESS - Science and Technology Publications","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2020]]},"DOI":"10.5220\/0008877502730279","type":"proceedings-article","created":{"date-parts":[[2020,3,13]],"date-time":"2020-03-13T12:54:47Z","timestamp":1584104087000},"page":"273-279","source":"Crossref","is-referenced-by-count":6,"title":["Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection"],"prefix":"10.5220","author":[{"given":"Imen","family":"Chakroun","sequence":"first","affiliation":[{"name":"Exascience Life Lab, IMEC, Leuven, Belgium, --- Select a Country ---"}]},{"given":"Thomas","family":"Ashby","sequence":"first","affiliation":[{"name":"Exascience Life Lab, IMEC, Leuven, Belgium, --- Select a Country ---"}]},{"given":"Sayantan","family":"Das","sequence":"first","affiliation":[{"name":"Advanced patterning, IMEC, Leuven, Belgium, --- Select a Country ---"}]},{"given":"Sandip","family":"Halder","sequence":"first","affiliation":[{"name":"Advanced patterning, IMEC, Leuven, Belgium, --- Select a Country ---"}]},{"given":"Roel","family":"Wuyts","sequence":"first","affiliation":[{"name":"Exascience Life Lab, IMEC, Leuven, Belgium, --- Select a Country ---"}]},{"given":"Wilfried","family":"Verachtert","sequence":"first","affiliation":[{"name":"Exascience Life Lab, IMEC, Leuven, Belgium, --- Select a Country ---"}]}],"member":"3171","event":{"name":"9th International Conference on Pattern Recognition Applications and Methods","location":"Valletta, Malta","start":{"date-parts":[[2020,2,22]]},"end":{"date-parts":[[2020,2,24]]}},"container-title":["Proceedings of the 9th International Conference on Pattern Recognition Applications and Methods"],"original-title":["Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection"],"deposited":{"date-parts":[[2020,4,1]],"date-time":"2020-04-01T12:06:55Z","timestamp":1585742815000},"score":1,"resource":{"primary":{"URL":"http:\/\/www.scitepress.org\/DigitalLibrary\/Link.aspx?doi=10.5220\/0008877502730279"}},"subtitle":[""],"short-title":[],"issued":{"date-parts":[[2020]]},"references-count":0,"URL":"https:\/\/doi.org\/10.5220\/0008877502730279","relation":{},"subject":[],"published":{"date-parts":[[2020]]}}}